Used VARIAN / AMAT / APPLIED MATERIALS VIISta 80 #9243147 for sale

VARIAN / AMAT / APPLIED MATERIALS VIISta 80 is an advanced ion implanter and monitor designed for semiconductor fabrication processes. Its advanced features enable the user to precisely control the ion beam energy, angle, and current density. This allows for highly precise doping of the substrate materials used in the fabrication process. AMAT VIISta 80 features a four-axis scanning system for fast, accurate alignment of the ion beam to the substrate material. It also offers several different user-selectable modes of operation, including batch processing, multi-pass processing, and custom implanting. Additionally, the ion beam can be customized to meet the specific needs of the application. VARIAN VIISta 80 also features a range of monitoring capabilities. It includes a beam current monitor, implant current monitor, temperature and pressure sensors, and an X-ray monitor for visualizing the implant depth. It also monitors the uniformity of the implant depth across the wafer surface. The intermediate mass filter (IMF) of APPLIED MATERIALS VIISta 80 provides precise filtering of the implanted ion beams. It helps eliminate unwanted ion species, such as trace atoms or heavy particles, ensuring that only the desired species is implanted in the substrate. This helps to minimize implant damage and yields a high-quality doping level. The software of VIISta 80 allows for optimization of process conditions. It can be used to control various parameters, such as gas pressures and voltages, for optimized substrates. It can also be used to create and store recipes for optimal processing conditions. Additionally, the VIISta software interface makes it easy to generate detailed system performance reports. In short, VARIAN / AMAT / APPLIED MATERIALS VIISta 80 is an advanced ion implanter and monitor optimized for semiconductor fabrication processes. Its four-axis scanning capabilities, user-selectable modes of operation, monitoring capabilities, intermediate mass filter, and optimized software make it a powerful tool for precision doping of the substrate materials used in the fabrication process.