Used VARIAN / AMAT / APPLIED MATERIALS VIISta 80 #9260239 for sale

VARIAN / AMAT / APPLIED MATERIALS VIISta 80 is a high-performance ion implanter and monitor. It is designed to provide the highest levels of precision and accuracy for implantation, an essential step in semiconductor manufacturing. AMAT VIISta 80 offers a wide array of features including high-precision ion source positioning, a source-to-sample distance range of up to 20 cm, a wide range of ion implanting energies, an integrated plasma source, advanced cooling and recreating systems, and an in-situ process monitoring package. VARIAN VIISta 80 is built on an advanced industrial automation platform that enables efficient operation with a wide range of cutting-edge features. The ion source positioning system allows for high-precision positioning of the ion source relative to the sample, allowing for exemplary uniformity of the implanted material. The source-to-sample distance range of up to 20 cm gives users unprecedented flexibility in the choice of ion implantation. Additionally, the machine offers a wide variety of ion implanting energies, allowing operation with an extended range of materials and applications. VIISta 80 incorporates an integrated RF plasma source capable of producing temperatures of up to 5,000 K, drastically increasing the speed and precision of supplying ions to the sample. The machine is equipped with a two-stage reactor process cooling and recreating system, ensuring consistent operation and providing efficient energy utilization. In addition, an advanced in-situ monitoring package ensures continual performance and feedback from the implantation process, allowing for technical insight into the operation of the implanter and promoting higher implantation quality and increased productivity. Overall, APPLIED MATERIALS VIISta 80 is the ideal machine for performing high-precision ion implantation with unparalleled accuracy and efficiency. Its advanced automation platform, wide range of ion implanting energies, integrated plasma source, and two-stage reactor process cooling and recreating system make it the optimal choice for semiconductor manufacturers. Additionally, its in-situ process monitoring package provides real-time feedback on the implantation process, allowing for exceptional control and quality assurance.