Used VARIAN / AMAT / APPLIED MATERIALS VIISta 80HP #293630184 for sale

VARIAN / AMAT / APPLIED MATERIALS VIISta 80HP
ID: 293630184
Vintage: 2004
Ion implanter 2004 vintage.
VARIAN / AMAT / APPLIED MATERIALS VIISta 80HP ion implanter & monitor is an advanced device for precise control of the dopant and other ion implantation processes. It is a compact equipment capable of providing both high power and high accuracy. The system is comprised of a high voltage power supply, an ion source, beam analysis and control unit, temperature control machine, shielding, and an ion beam monitor. The power supply has a maximum voltage of 1,000 kV and provides up to 80kW of implant power. It also features a high-frequency pre-bias capability for improved uniformity of the implanted area. The power supply also includes an automated diagnostic feature that can be used to detect any irregularities in the process. The ion source provides a controlled and highly localized plasma that can be used to generate beam current densities up to 25mA/cm2. The beam analysis and control tool utilizes a sophisticated particle optics in order to ensure that only the desired particles are implanted. The temperature control asset is capable of maintaining the optimal temperature conditions for the implantation process. It also includes a thermal imaging camera model which enables monitoring of the source temperature during implantation. The shielding equipment is comprised of advanced materials and shielding designs which provide excellent protection against radiation, and ensure that only harmless levels of residual radiation can reach the interlock system. The ion beam monitor continuously measures the beam parameters, including current, energy, and position, providing feedback to adjust the beam in order to reduce any undesirable non-uniformities in the implant. Overall, AMAT VIISta 80HP ion implanter & monitor is a high-performance unit designed to enable precise control of ion implantation processes. It is a reliable and versatile device for the implant step in semiconductor fabrication, offering a wide range of beam current and power settings, and a comprehensive set of safety features.
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