Used VARIAN / AMAT / APPLIED MATERIALS VIISta 80HP #9292217 for sale
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ID: 9292217
Ion implanter
IAN Computer, P/N: E11130730
NCS Computer, P/N: E11083873
End station:
Platform type: UES Buffer, P/N: E11138370
(4) BROOKS AUTOMATION Fixload 6 Loadports
BROOKS AUTOMATION DBM 2706 Buffer robot
(2) BROOKS AUTOMATION VAC-407-2A PRI Robots, P/N: E40001450
Source module:
Gas box, P/N: E11140710
IHC Source removed
Manipulator
Part number / Gas stick
E11116732 / Gas1
E11147261 / Gas2
E11147241 / Gas3
E11147251 / Gas4
E11116782 / Gas5
Beam-line module:
90° Magnet assembly
Decel lens assembly
70° Magnet assembly
D2 Lens: Lens assembly and ES Decel
Process chamber module:
Angle cup: E11127951
Roplat kit
(2) MKS 354019-TD-T Vacuum gauges
(2) EDWARD STP-A2203C2 Turbo pumps
(2) EDWARD SCU-1500 Turbo pump controllers
PFEIFFER TMH-261 YPX Turbo pump
(3) CTI-CRYOGENICS OBIS-250F Pumps
(2) CTI-CRYOGENICS 9600 Turbo pumps
(2) EDWARD IQDP80 / QMB500 Rough pumps
EDWARD IGX100M Rough pump
Main PD assembly, P/N: E17352070
Remote PD, P/N: E19012371
Missing parts:
AFFINITY PAA-003B-CE50CBD3 Platen chiller
(2) Manipulator controllers, P/N: E11290090
Beam gate assembly, P/N: E11084150
Supply interface PCB, P/N: E15003820
Orient assembly, P/N: E11320430
PMC A3 Board, P/N: E11559950
Left PRI Robot, P/N: E40001450
ESC, P/N: E11368067
Bipolar switch box, P/N: E11335731
QUAD2 Lens assembly, P/N: E11320190
QUAD2 Power supply, P/N: E19297910
D2 Power supply, P/N: E11326011
Source isolation controller, P/N: E11106222
K2 Relay, P/N: E65000649
(3) ADIO, P/N: E11292270
PFG Controller, P/N: E11092090
V17 Valve, P/N: E32000150
Scan motor assembly, P/N: E11061452
L/P Clamp assembly
ARC Power supply CABLE, P/N: E16135690
IG2 Gauge, P/N: 354019-TD-T
(2) IG3 Gauges, P/N: 354019-TD-T
G2 Gauge, P/N: E33000206
G3 Gauge, P/N: E33000206
G10 Gauge, P/N: E33000206.
VARIAN / AMAT / APPLIED MATERIALS VIISta 80HP Ion Implanter and Monitor is a high-precision instrument that is widely used in the semiconductor manufacturing industry. It is a heavy-duty tool that is capable of executing high-precision ion implantations and accurate deposition monitorings. AMAT VIISta 80HP uses three distinct beam sources to implant ions into a variety of semiconductor materials. These include boron, phosphorus, arsenic, and antimony. The monitor consists of an X-ray detector, which is used to measure the intensities of the X-rays generated by the implantation process. Through the combination of the three distinct sources, a precise pattern of ion implantation is achievable in order to optimize the properties of semiconductor devices. In addition to ion implantation, VARIAN VIISTA 80 HP also provides accurate deposition monitoring. During the deposition process, the X-ray detector is used to measure the thickness of the deposited layers. This ensures that the predetermined thickness of the layers is achieved for optimum performance of the semiconductor device. When it comes to control and accuracy, APPLIED MATERIALS VIISta 80HP is designed to provide the highest level of control. It houses various computer systems, which are capable of providing a high level of accuracy and precision. The computer systems are integrated with a graphical user interface, which is straightforward and easy for users to manipulate. Additionally, the system utilizes an advanced monitoring system which makes it easy for users to detect any problems that may occur during the implantation process. Overall, VARIAN / AMAT / APPLIED MATERIALS VIISTA 80 HP is a high-performance ion implanter and monitor. It has the capability to execute precise ion implantations and accurately monitor deposition processes. Moreover, its user-friendly graphical interface and highly accurate monitoring system make it an ideal tool for the semiconductor industry.
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