Used VARIAN / AMAT / APPLIED MATERIALS VIISta 80HP #9292218 for sale
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ID: 9292218
Ion implanter
IAN Computer, P/N: E11130730
NCS Computer, P/N: E11083873
End station:
Platform type: UES Buffer, P/N: E11138370
(4) BROOKS AUTOMATION Fixload 6 Loadports
BROOKS AUTOMATION DBM 2706 Buffer robot
(2) BROOKS AUTOMATION VAC-407-2A PRI Robots, P/N: E40001450
Source module:
Gas box, P/N: E11140710
Manipulator
Part number / Gas stick
E11116732 / Gas1
E11147261 / Gas2
E11147241 / Gas3
E11147251 / Gas4
E11116782 / Gas5
Beamline module:
90° Magnet assembly
Beamgate assembly
Decel lens assembly
70° Magnet assembly
D2 Lens: Lens assembly and ES Decel
Process chamber module: Roplat kit
(4) MKS 354019-TD-T Vacuum gauges
(2) EDWARD STP-A2203C2 Turbo pumps
EDWARD SCU-1600 Turbo pump controller
EDWARD SCU-1500 Turbo pump controller
(2) PFEIFFER TMH-261 YPX Turbo pumps
(3) CTI-CRYOGENICS OBIS-250F Pumps
(2) CTI-CRYOGENICS 9600 Turbo pumps
EDWARD IQDP80 / QMB500 Rough pump
EDWARD IGX100M Rough pump
Main PD assy: Circuit breaker kit
CVCF PD, P/N: E19009490
Remote rack
Missing parts:
AFFINITY PAA-003B-CE50CBD3 Platen chiller
(2) Manipulator controllers, P/N: E11290090
Angle cup assy, P/N: E11127951
Setup cup PCB, P/N: E11084150
TMC A2 Board, P/N: E11559860
TMC A4 Board, P/N: E12013370
QUAD2 Lens assembly, P/N: E11320190
ESC, P/N: E11368067
Source isolation controller, P/N: E11106222
Twist motor, P/N: E11130962
Loadlock vent pressure regulator, P/N: E33000355
LP2 ST32 Board P/N: 013501-167-27
Buffer robot controller fuse.
VARIAN / AMAT / APPLIED MATERIALS VIISta 80HP is an ion implanter and monitor used in the production of semiconductor chips. The device is used to implant ions on the surface of the wafers, changing their electrical properties. AMAT VIISta 80HP is a high-end implanter, capable of accurately and consistently implanting ions in a wide range of materials and conditions. The device features a wide range of performance capabilities. It is capable of implanting boron, phosphorus, arsenic, and antimony, along with other ions, and can operate at energies up to 100 kilo electron vetts. It also has a uniformity of +- 1%, an accuracy of 0.1% down to 0.01%, and a resolution better than 1 nm for larger implant regions. The device has a throughput of up to 8 wafers per hour, meaning it can implant up to 8 million ions per second. In addition, VARIAN VIISTA 80 HP has a comprehensive monitoring and control system. It is equipped with a real-time energy readout device which enables the voltage and current ramping to be monitored and adjusted as needed. It also has a real-time dynamic range adjustment, which ensures that the implanted ions stay within the desired range. The performance and monitoring of VIISta 80HP can also be adjusted depending on the specific application. The Triple Filter Management System is designed to optimize performance and minimize defects while maintaining the desired implant doses. It combines three integrated channels to give precision control over multiple parameters. VARIAN / AMAT / APPLIED MATERIALS VIISTA 80 HP is also designed to reduce waste and emissions, as it has low water and exhaust requirements. The device is capable of self-monitoring and self-correcting operation, and can operate from a single plug and power outlet. This makes it an energy-efficient choice for production lines. Overall, VARIAN VIISta 80HP is a powerful and reliable ion implantation device. The device is capable of precise and consistent operations, and its energy efficiency makes it an excellent choice for production line applications. With its comprehensive monitoring and control systems, AMAT VIISTA 80 HP can ensure that implants are performed accurately and consistently.
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