Used VARIAN / AMAT / APPLIED MATERIALS VIISta HC #293646025 for sale
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ID: 293646025
Ion implanter
Process chamber
COMP II ESC
Roplat tilter assembly
UES2 Process end station
Dual load locks:
25 Wafer capacity
Polished integrated loadlock
Self aligning atmospheric door
4-Wafer walk out sensors in pass through cassette
Through-beam wafer mapping sensor
BROOKS AUTOMATION DBM- 2076V2 Buffer robot with track movement
ESC Controller:
P/N: E19283790
MFC / Pressure unit: Argon, BF3, AsH3, PH3
Drive mechanism:
E11320430 Orientor Assembly
VAC-407 IN VAC Arms
Foups/Load ports: 4-FOUP Complies
Module:
Gas module 1: Argon
Gas module 2: BF3
Gas module 3: AsH3
Gas module 4: PH3
Exhaust / Pump system:
BOC EDWARDS STP-A Source turbo pump
BOC EDWARDS STP-A Beam line turbo pump
EBARA A10S Source rough pump
EBARA A10S End station rough pump
BROOKS OBIS320FE Cryo pump
TC750 Load-Lock Turbo pump
Power supply: 3 Phase, 208 VAC.
VARIAN / AMAT / APPLIED MATERIALS VIISta HC is an ion implanter and monitor designed to provide excellent process control and high productivity in semiconductor device fabrication. The equipment's advanced capabilities are housed within a single chamber and controlled by a user-friendly interface. The system's ion implanter section consists of a large, cylindrical high-energy accelerator with an adjustable opening angle that can be set to a range of different values to adjust the angular spread of the ions. This allows for a variety of implantation selectivity options, such as high-angle and broad-area implants. The unit also has a high-precision, 10-axis feedthrough that can be positioned with micron-level accuracy, allowing for precise control of the ion beam's position, size and shape. The machine's monitor section features a multi-detector set-up, which can measure a range of parameters including implanter beam current and energy, flux density, high-angle scattering, and angle spread. This allows for continuous quality control of the implantation process and minimizes the risk of device failures. The tool is also equipped with several safety features, such as emergency stop and shield protection, to prevent exposure to high-energy radiation and minimize the risk of injury while operating the asset. It also contains a sophisticated model of optical and electrical diagnostics to monitor the ion beam's properties and ensure optimum performance. In addition, AMAT VIISta HC is designed for easy integration into existing production lines, with options for connection to peripheral components, such as plasma or etching systems. This provides a great degree of flexibility and ensures reliable operation of the entire production line. Overall, VARIAN VIISta HC is a powerful and reliable implanter and monitor, capable of providing superb process control and high productivity in semiconductor device fabrication.
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