Used VARIAN / AMAT / APPLIED MATERIALS VIISta HC #293651987 for sale
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ID: 293651987
Wafer Size: 8"-12"
Vintage: 2005
Ion implanter, 8"-12"
Process chamber
Pumps not included
Source head: Advance 54mm
ESC (Platen): COMP II
Roplat tilter assembly
UES2 Process endstation
Load locks:
Dual, 25 Wafer capacity
Polished integrated loadlock
Self aligning atmospheric door
4-Wafer walk out sensors in pass through cassette
Through-beam wafer mapping sensor
BROOKS DBM- 2076V2 Buffer robot with track movement
ESC Controller:
P/N: E19283790
MFC / Pressure unit: Argon, BF3, AsH3, PH3
Drive mechanism:
E11320430 Orientor assembly
VAC-407 IN VAC Arms
Foups/Load ports: 4-FOUP Complies
Module:
Gas module 1: Argon
Gas module 2: BF3
Gas module 3: AsH3
Gas module 4: PH3
Power supply: 3 Phase, 208 VAC
2005 vintage.
VARIAN / AMAT / APPLIED MATERIALS VIISta HC is a high current ion implanter and monitor, developed to provide high productivity with superior process control and reliability. It combines a variety of technologies to enable superior performance including a high-voltage power supply, a high-current beam injection equipment, and an advanced monitoring and control system. The high-current power supply offers a large dynamic range of up to 3 μA to 45 keV, for thin and thick substrates up to 200mm in diameter. The injection unit design ensures accurate particle flux and current delivery, facilitating consistent and repeatable implants. It also provides digital closed-loop control of all crucial parameters, such as energy, current, beam travels, and scan speeds. The advanced monitoring and control machine is designed to maximize sample quality and to minimize manual intervention. It features multiple sensors for process monitoring, a programmable logic controller to interface the implant controller, and an interactive control interface for user-defined parameters. Additionally, the implementation of the tool provides for highly accurate implantation times and improved overall process control. AMAT VIISta HC Ion Implanter and Monitor is designed to meet the most demanding requirements for uniformity, throughput, and capacity. It is designed to increase throughput and improve production levels, as well as meet the tightest specifications. Furthermore, it is designed for easy maintenance and process optimization for different production requirements. Additionally, it provides digital signal processing and data display to ensure precise analysis for optimum implant results.
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