Used VARIAN / AMAT / APPLIED MATERIALS VIISta PLAD T2 #9203300 for sale
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ID: 9203300
Wafer Size: 12"
Vintage: 2007
High dose implanter, 12"
Single wafer plasma doping system
(2) VIISta PLAD process modules
Plasma implant voltage range: 200V to 10kV
Using precision pulsed DC supply
Programmable ramped wafer bias for optimum dopant profile control
High density plasma generation
Control system
Real-time magnetically suppressed Faraday closed loop dose control system
Electrostatic wafer platens
With He backside gas cooling
Automated pressure control system
Base system includes
Power distribution: 50/60 Hz
VIISta single-wafer end station & tool control
Dual wafer capacity: 25
Polished load locks
Independent vacuum control
High voltage power supply drivers
Uninterruptible power supply
Transport module vacuum chamber
Dual vacuum robots
Horizontal motion control
Backside pick-and-place wafer handling
Orientation & centering station
Automatic pumping system:
(2) PFEIFFER 1201 Turbo-molecular pumps
One per process module
(2) PFEIFFER 261
Turbo-molecular pumps
Remote rack assembly:
Plasma power supply drivers
Deionized water recirculation system
Power distribution panel to support all controllers & sub-systems
Remote cabling ten meters
Rack space for mechanical dry pumps
VCS Runs on the Microsoft Windows NT / Windows 2000
Multitasking operating system
Process gas control module
Standard 4 channel gas module including three toxic
One inert gas
5 Channels per process module
System I/O: VARIAN control system
SEMI S2-0200 & S8-0701 compliant
VIISta factory automation
S-series buffer with 4 load ports
Direct-drive atmospheric robot & thru-beam mapping capability
Facilities from bottom
Factory automation kit brooks S-series EFEM
With vision loadports
Operation: 60 Hz
Gas box: 5 Channels per chamber
Process gas input from the bottom: 5 Channels
Left process chamber for CH4 left process chamber for CH4
Right process chamber for AsH3/PH3
Configure system for right chamber to run AsH3 and PH3 process
Label kit
POC UHP Roof
Standard remote module
T2 15m remote harness
Hose kit T2 15m remote harness
T2 15m remote hose kit
2007 vintage.
VARIAN / AMAT / APPLIED MATERIALS VIISta PLAD T2 is a state-of-the-art ion implanter and monitor equipment designed and manufactured by one of the world's leading semiconductor equipment suppliers. It features a unique integrated in-vacuum implantation system capable of producing homogenous and efficient ion implantation doses. AMAT VIISta PLAD T2 features a fully automated software unit that allows precise implantation profiles to be achieved for virtually any application. The machine offers an integrated beam profile monitor with a wide range of measurement capabilities, allowing customers to closely monitor the implantation process, ensuring safety, device yield, and process optimization. VARIAN VIISta PLAD T2 provides a fully-customizable platform to meet the needs of a wide range of implantation processes. It can support integration with other AMAT systems, such as scans for scanning surveillance tools, ion film thickness monitors, and temperature controllers. APPLIED MATERIALS VIISta PLAD T2 features a high- resolution, 360° imaging tool. This asset allows for the highest level of implantation profiles to be achieved while ensuring precise and repeatable results. VIISta PLAD T2 also includes an advanced control cabinet with an integrated power supply model offering unmatched stability, accuracy, and reliability. VARIAN / AMAT / APPLIED MATERIALS VIISta PLAD T2 monitors feature improved process control and real-time alarming capabilities as well as integration with other systems for increased automation. Additionally, the equipment incorporates patented Compact Implant Source Technology, which is designed to improve implant geometry, reduce drift, and improve process uniformity. The system also provides users with a wide range of monitoring, matching, and analysis capabilities for measuring beam shape and fluctuations in order to confirm the optimum operation of the unit at all times. In summary, theVIISta PLAD T2 is a state-of-the-art ion implanter and monitor machine from VARIAN. It provides a fully-customizable platform with integrated beam profile monitoring, process control and alarming capabilities, high-resolution imaging and integrated power supply. Additionally, it features Compact Implant Source Technology that is designed to improve implant geometry, reduce drift, and improve process uniformity. All of these features come together to create a state-of-the-art tool that can provide precise and repeatable implantation results effectively and efficiently.
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