Used VARIAN / AMAT / APPLIED MATERIALS VIISta #9292131 for sale

VARIAN / AMAT / APPLIED MATERIALS VIISta is an advanced ion implanter and monitor designed to provide high-precision ion beam delivery for semiconductor device fabrication. It is capable of delivering a wide range of beam energies, and consequently a wide variety of ion species, while controlling beam intensity and placement with remarkable accuracy. The unit is composed of several modules, including the ion beam accelerating and beam forming components, the beam scanning equipment, and the end station. The accelerating system utilizes an axial field magnetic resonance design for ion beam energy control. This design is capable of producing ion beams up to 500keV. The power supply for this unit also includes fast-pulsed detection and control circuits for precise beam energy regulation. Additionally, the machine includes several beam quality monitors to ensure the beam is appropriate for the application. The ion beam scanning tool is based on an advanced, fast-steering asset that produces Lissajous-like patterns to accurately direct the beam into the wafer. This model includes a computer-controlled high-speed equipment that can produce up to 256 areas per second with a resolution of up to 0.02 microns. The ion beam steerer is also capable of producing very small circular pattern targets for superior control. The end station is a fully automated wafer handling unit with an integrated process monitor. This unit includes several sensors to track the position and orientation of the wafer and the ion beam, and to monitor the implant process. It also utilizes onboard software for device tracking and analysis. Additionally, the unit includes a versatile wafer chucking system for different substrate types and an adjustable chamber for manipulating implant depth. Finally, the unit includes a bi-directional communication interface for integrating into computer networks. In summary, AMAT VIISta is an advanced ion implanter and monitor capable of delivering precise beam energies and accurately controlling beam placement with remarkable accuracy. Its many components, from the ion beam accelerating unit and beam scan control to the end station with its integrated process monitoring algorithm, make this an ideal choice for any semiconductor device fabrication needs.