Used VARIAN CF 3000 #9242115 for sale
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ID: 9242115
Ion implanter
AGILENT VHS-4 Diffusion pump
Gas box with (3) sources of admixtures in the form of BF3, PH3 & AsH3 gases in praxair up-time system, horiba massometers
Power source
(3) ADIXEN Rotary pump
Compressor with (2) cryoplex & (8) OXFORD pumps
Hycool wheel
Freeman source
DI Water station: Transition from freon cooling to cooling with de-ionized water
Scanners from IBS cooled with air
Range of energy: <20keV to >120keV
Range of dose: 2e11 cm^-2 to 6e15 cm^-2.
VARIAN CF 3000 Ion Implanter & Monitor is a together revolutionary ion implantation and monitoring system developed by VARIAN, Inc. It is the world's most advanced ion implanter, capable of providing maximum flexibility, reliability, and performance in a compact design. It is a multi-source, multi-target device that is designed to be cost-effective, with easily and quickly adjustable parameters. The device is equipped with a unique ion source for the independent control of specialized ion implantation parameters. This source has a beam current range of 1-10mA and a beam energy range of 0-7,000 eV, allowing for precise control of each implantation process. Its beam current density can range up to 600A/cm², giving it the capability to perform broad ranges of implantation processes. This source is designed to provide higher current implantation processes at shorter dwell times for more precision during applications with critical parameters. VARIAN CF3000 comes with a modern monitor design for quickly and accurately measuring substrate parameters as the implantation process evolves. The monitor is capable of measuring parameters such as the depth of implant, substrate temperature, ion beam currents and energies, substrate size, and more. The monitor has a small footprint and an extended depth range which allows for it to fit inside a small vacuum chamber, saving valuable space in the lab. The system is equipped with an active platform which is designed for ultra-smooth movement of the wafer in 6-axes, including horizontal, vertical, rotational, and tilt motion. This is controlled by a user-friendly and intuitive software interface which allows for easy manipulation of the wafer substrate. It also features high-precision temperature control and an active cooling system to ensure consistent and precise results. CF-3000 also has a compact design with an integrated power supply, helping to save valuable lab spaces as well as reduce operating costs. The device is designed to be maintenance-free for years of reliable use, with an extended lifecycle that ensures accuracy and long-term productivity. CF3000 is ideal for lab environments where precise control of implantation parameters are required such as in the semiconductor manufacturing and research and development fields. This is an ideal device for those looking for a cost-effective and versatile implanter with maximum precision and control.
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