Used VARIAN CF5 #9210374 for sale

Manufacturer
VARIAN
Model
CF5
ID: 9210374
Ion implanter CTI Cryo pump AMU Meter Research end station Flow: Cassette to cassette Oxygen and SiF Platens for heat / LN2 Wafers (3) WELCH 1397 Mech pumps THERMO NESLAB Recirculating chiller (2) Bernas sources 200kev.
VARIAN CF5 is an ion implanter and monitor built by VARIAN Semiconductor Equipment, part of VARIAN Group. VARIAN CF-5 offers a comprehensive range of tools and capabilities to support advanced ion implantation processing. CF 5 features a high-energy, high beam current, and high-precision electron impact source for ion implantation. It is equipped with a high-performance controller, a powerful energy-oriented windowed implant operating environment, and a robust beamline designed to process a variety of materials. Additionally, CF5 offers advanced process control functions that enable users to achieve results to deal with a variety of implant requirements. CF-5 has a capacity of 60-150KV implant energy and 1-500uA beam current, as well as a wide range of source beam tuning capabilities to create optimal-quality implants. In addition, VARIAN CF 5 also offers highly precise dose control capabilities, with pressures between 0.001-1 mTorr. Coupled with a sophisticated, high-precision pressure-to-dose calibration system, VARIAN CF5 is capable of generating highly consistent batches of implants. Moreover, VARIAN CF-5's uniformity mode is designed to provide uniform dose and energy distribution, while maintaining uniform dosage, energy and beam intensity. The module can also achieve extremely precise positioning and alignment parameters for rigorous control of implantation. CF 5's advanced ion monitor is designed to provide real-time monitoring of process parameters such as nozzle size, distance between nozzle and sample, and injected energy, while continuously adjusting for optimum results. The monitor comes with an intuitive graphical interface, comprehensive system logging capabilities, and traceable data to ensure the most precise monitoring possible. In summary, CF5 is an advanced, high-quality ion implanter and monitor designed to provide users with a comprehensive range of options for their ion implantation processes, as well as highly precise dose control capabilities coupled with sophisticated, high-precision pressure-to-dose calibration. Additionally, CF-5 also features an advanced ion monitor for real-time process monitoring, and a traceable data system to ensure the most precise results possible.
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