Used VARIAN DF4 #9161508 for sale

VARIAN DF4 is an ion implanter and monitor used to cary out precise ion implantation. It is a high power implanter designed to enhance the reliability and consistency of the implantation process in the semiconductor manufacturing industry. The equipment uses a high voltage RF Generator, Accelerator and beamline components to enable high currents up to 150mA and energies up to 32 keV for heavy ions. These components create a self-balancing beam propagation system that ensures accuracy in dynamic beams for maximum accuracy and repeatability. The unit supports ions such as sulfur, nitrogen, boron, phosphorus, and arsenic, and can operate with both DC & RF bias of 1MHz & 500kHz. The RF Generator permits the selection of a wide range of implant conditions to optimize the ion implantation process. Furthermore, the RF Generator is capable of incorporated an RF Bias switch which actively adjusts the RF Bias Voltage during the implant process to optimize implant conditions. DF4's high throughput capabilities also make it a cost-effective solution for many semiconductor production processes. The machine enables a high dose implant rate of up to 40 um/min for targeted regions and can operate with a range of various pressure and gas types. This allows for use in a variety of semiconductor production processes. VARIAN DF4 includes a robust, high quality craftsmanship that enhances its utility and durability. It features an ergonomic design consisting of multiple mounting points and adjustable feet to ensure secure and safe use of the device on a variety of substrates. The beamline supports a max beam current of 18 nA and is made of robust vacuum quality materials for maximum longevity of the device. The tool includes an advanced monitoring asset capable of continuously monitoring and creating reports on the implant process for precise control over any production environment. The monitoring model includes a Vacuum Control Equipment that monitors all vacuum parameters such as pressure, temperature, and gas flow rate. This provides real-time feedback to the operator to ensure accuracy of the implant process. The monitoring system can also report on the ion source profile, beamline and target configuration parameters. Overall, DF4 is a versatile and reliable ion implanter and monitor perfect for precise ion implantation processes in the semiconductor production field. It's advanced monitoring and RF generator unit provides real-time feedback for precisely controlled and accurately repeatable implant processes. Its rugged construction and adjustable feet make the device ideal for any production environment and it's high throughput capabilities allow for a cost-effective solution to ion implantation needs.