Used VARIAN DF5394-1 #9260507 for sale

VARIAN DF5394-1 is an advanced ion implanter and monitor that is specifically designed to provide reliable, high-performance implantation of multiple ions into wafer substrates. DF5394-1 is a multi-beam, medium current ion implanter that features a range of components to ensure optimal implantation processes in a variety of application settings. VARIAN DF5394-1 comes equipped with an advanced Mass Flow Controller (MFC) that provides precise control of the process-limiting anions and cations, as well as a Peak Lock Control (PLC) system that helps ensure reliable parallelism and uniformity. Both of these systems enable high-level accuracy in the implantation process, reducing emissions and improving performance. The implantation source of the implanter is a single-cathode, low-energy diode design. This system allows for the implanter to operate at a range of energies, from low to high levels. With an anode limit of 900V, the implanter can achieve high performance across a wide range of implantation materials, including silicon, boron, fluorine, and other species. The diode design also ensures the quick response time of the implanter, helping to reduce the time required to complete the implantation process. DF5394-1 features a specialized monitor for easy monitoring during the implantation process. This monitor offers the ability to monitor multiple ions at the same time, allowing the user to easily observe each step of the implantation process. This provides better control, as well as easier adjustment of the implantation process if necessary. The monitor also includes an automated dose adjustment system, providing precise control of the implantation process while eliminating the need for manual adjustment. VARIAN DF5394-1 provides a reliable performance design that is tailored for optical, high-precision, and highly efficient implantation operations. Its advanced components ensure easy operation and increased accuracy throughout the process, while the monitor enables continuous monitoring and detailed control of the implantation process. The low-energy source allows for a variety of implantable species and energetic levels, making DF5394-1 a reliable and versatile implanter for multiple application settings.