Used VARIAN Disk for 160XP #9412732 for sale

VARIAN Disk for 160XP is a high-performance ion implanter and monitor equipment. It is designed to provide precise and accurate implantation of ions into substrates, such as semiconductor wafers. The system is able to precisely control and measure ion energies, ion doses, and beam profile, along with the beam current, allowing for optimal processing of materials. Disk for 160XP is also equipped with sophisticated internal control and monitoring software, which allows for precise process control and analysis. VARIAN Disk for 160XP unit is composed of two main components; the Disk and the 160XP ion source. The Disk is a vacuum-insulated, non-magnetic chamber, which houses the ion beam delivery and monitoring components of the machine. The 160XP ion source is an electron-beam-controlled source, specially designed for implanting ions at high current densities with precise energy control. It is highly reliable and has a low maintenance cost. Disk for 160XP provides precision control of the ion beam in a variety of ways. It is able to control and regulate the energy of the ions being implanted and their arrival times. The energy range of VARIAN Disk for 160XP can peak at 200 keV, making it ideal for processing a variety of wafer materials. Additionally, the Disk can precisely position and scan the ion beam to produce the desired implant profile on the wafer. The 160XP ion source is capable of producing higher current densities than other sources, allowing for faster implantation coverage. This results in increased productivity when implanting substrates. The ion source is also designed to minimize background neutral particles, reducing the rate of contamination and enabling cleaner deposition of ions. Disk for 160XP is a powerful ion implanter and monitor tool, designed to provide precise and accurate control of the ion beam. Its sophisticated internal control and monitoring software enables precise process control and analysis. VARIAN Disk for 160XP is the ideal tool for implanting a variety of wafer materials with higher current densities, resulting in increased productivity.