Used VARIAN Disk for 160XP #9412733 for sale

ID: 9412733
Wafer Size: 4"
4".
VARIAN Disk for 160XP is an innovative ion implanter and monitor. It is designed for demanding semiconductor ion implantation processes and is capable of ultra-high-precision, high-throughput operation. The equipment's advanced 2D semiconductor processor and integrated 3D X-ray imaging system allow it to perform the most delicate ion implantation processes while monitoring the implant process in real-time. The 160XP features an E -Beam generator, capable of delivering up to 1.5kW of power, allowing simultaneous implantation with higher currents and voltages than competing technologies. The unit's advanced lithography software maintains the required doses of electrons and ions at all times during the implantation process, with exceptional accuracy and precision. VARIAN unique ceramic induction focusing technology directs the ions with extreme precision, achieving greater control over the implantation process and improving process repeatability. The enhanced focusing machine further optimizes the beam parameters such as profile and dose, delivering an improved implantation performance in a single batch. An advanced X-ray imaging systems allows a full 3D view of the implanted samples. The tool is capable of simultaneously monitoring the implant process in real-time, while tracking its dosimetry, which enables optimal implant parameters that can be replicable. The advanced imaging asset also provides automated detection of the implanted species, allowing process optimization at the same time. The 160XP can be integrated with laboratory data systems and Host Processing Unit for extra flexibility, allowing for the control and monitoring of implant operations from remote locations. The model is designed to deliver ultra-high-precision and high-throughput ion implantations, making it ideal for semiconductor manufacturing.
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