Used VARIAN E1000 #181223 for sale

VARIAN E1000 is an ion implanter and monitor commonly used in the semiconductor industry. VARIAN E-1000 is designed to meet the rigorous demands of semiconductor manufacturing processes, and is highly efficient in dopant implantation and ion beam mix control. E 1000 uses the latest innovations in beam source, magnetic and electrostatic optics, and beam profilers, allowing the equipment to deliver a high degree of accuracy and precision for dopant implantation and other operations. E-1000 utilizes a unique beam dispersion system that creates variable ion fractions for flexible ion beam mixing, resulting in improved process control. Additionally, E1000's large beam chamber allows for rapid scanning and high throughput as well as low-cost maintenance. VARIAN E 1000's optimized beam-target workflow enables the delivery of high-quality doping profiles and improved yield rates. Advanced beam position monitors, sophisticated beam current monitors, and real-time scanning options further provide for reliable and consistent dopant profiles. Additionally, VARIAN E1000 uses multiple implantation chambers for concurrent ion implantation and cross-sectioning, optimizing the process by minimizing probe time and down time. The unit features a patented proprietary Vacuum Scan Machine, which improves pressure stability and maximizes beam uniformity and performance. In addition, VARIAN E-1000 also features a Digital Scan Tool, providing advanced biasing and control capabilities for lower beam currents and improved irradiance uniformity. In addition to its numerous features, E 1000 also features sophisticated software controls, including a comprehensive visualization asset, a comprehensive user interface, and a comprehensive data analysis package. These software components provide users with process control and analysis capabilities needed to monitor each stage of the implantation process.In sum, E-1000 boasts an array of advanced features and software capabilities that offer semiconductor manufacturing facilities unparalleled accuracy and precision for dopant implantation, as well as unmatched process control and yield optimisation.