Used VARIAN E1000 #200760 for sale

VARIAN E1000 is a high-precision ion implanter and monitor designed for use in the semiconductor industry. It combines a beam line, ion source, beam diagnostic instrumentation, and a high-resolution beam scanning equipment into one compact machine and offers end-to-end process control. The implanter uses a vertically-mounted ion source to generate ion beams, and the accelerated ions are then directed toward the target wafer through an in-line beam transport system. The ion performance is optimized with the use of field emission ion sources, RF power supplies, mass spectrometry, high-resolution beam scanning, and advanced beam monitoring instrumentation. VARIAN E-1000 features a two-stage implanter and a high-resolution beam from 0.5 to 50 keV. The unit is capable of implanting various species of ions with high current to a maximum of 200mA and is equipped with advanced beam diagnostic instrumentation and beam steering technology. It is also designed to perform single-wafer processing at high throughput, with current uniformity and excellent control of implant angle and dose. E 1000 has a built-in, flat-panel display and an intuitive user interface, allowing for easy access to all aspects of the machine configuration. Advanced signal processing algorithms—such as those used for beam spot size detection and current compensation—are also available, ensuring accurate and precise implant performance. For additional protection during operation, E-1000 is equipped with a safety interlock tool, beam stop, and overcurrent protection. VARIAN E 1000 is an ideal choice for semiconductor device processing due to its advanced beam diagnostic instrumentation, user-friendly interface, and safety features. The machine's high-precision ion implanter and monitor can be used for a broad range of ion implantation applications, making it the ideal solution for a wide variety of semiconductor fabrication processes.