Used VARIAN E1000 #44234 for sale

VARIAN E1000 is an ion implanter and monitor that can be used to modify and relocalize dopant ions in semiconductors and solid state devices. It is a complete ion implanting equipment that offers reliable, repeatable and cost-effective implantation of various ions in order to modify the electrical characteristics of semiconductor devices. VARIAN E-1000 is able to achieve high-accuracy implantation with high-quality results due to its advanced technology and stringent process control. The system utilizes a large beam energy range to provide flexibility in controlling implantation depth and dose. It is capable of implantation depths up to 100 microns in just a few seconds. This unit is also equipped with an extremely accurate beam monitor which allows for real-time measurement of implantation parameters, ensuring general process accuracy and repeatability. E 1000 includes a reliable thermal field emission gun that offers an appropriately controlled hot filament and an adjustable emission current to produce an ion beam with low-emittance, thereby reducing heat load and beam distortion. The gun is capable of operation at up to 120 keV beam energy and operates with a uniform and consistent implant distribution. The machine also includes sophisticated computerized control systems and powerful motion hardware, giving the user the ability to monitor and control every stage of the implantation process. The user friendly and intuitive graphical user interphase assist in the navigation of the process navigation and parameters. The implanter is also able to monitor implantation doses in real-time and operator safety is further increased with safety locks, which prevent unauthorized access to the implanter and machine area. E1000 offers a reliable and superior performing ion implanter for use in multiple industries. With its advanced technology and through process control, the tool was designed for accuracy, repeatability and quality.