Used VARIAN E1000 #9102189 for sale

VARIAN E1000 is a power-efficient, precision ion implanter and monitor designed to provide high-end, high-yield manufacturing support in the semiconductor industry. VARIAN E-1000 utilizes an ion source to rapidly and efficiently implant ions into a wafer, with a uniform depth and width, which helps to achieve a desired performance level. E 1000 is designed in such a way that it can be customized and adjusted according to specific requirements. With its fast accelerator system and small load size, E-1000 is capable of delivering up to 400keV implantation energy, at up to 20mA/cm2 dose rates. This allows for fast and accurate implantation, as well as effective dose monitoring and control. The advanced beam optics and control systems of VARIAN E 1000 provide precision and gentle implantation, allowing for a variety of implant parameters such as beam uniformity, wafer orientation and depth of implantation to be closely controlled. Additionally, its advanced beam matching circuit helps in providing superior beam alignment, thus helping to ensure a uniform implantation. E1000 is equipped with various monitoring systems that help to maintain quality control. A visual monitor is used to observe the implantation process, while a post-implantation monitoring system records the dose-related parameters of each implant. Additionally, a contamination-resistant chamber helps to minimize particle contamination, which can lead to product defects. VARIAN E1000 is equipped with a variety of safety features and is capable of operating in a completely safe and reliable manner, with a range of adjustable safety settings and alarms. This helps to ensure that the user is fully aware of when an operation requires attention, thus reducing the possibility of accidents or errors. In summary, VARIAN E-1000 is a highly efficient and reliable ion implanter and monitor, providing superior manufacturing support to the semiconductor industry. Its high-end technologies and safety features help to ensure accurate and precise implants, while also reducing costs and providing excellent yield.