Used VARIAN E1000HP #187202 for sale
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ID: 187202
Wafer Size: 8"
Vintage: 1994
Implanter, 8"
Non-SMIF
Jar type
S6 Motor
Gas type: CGA Type:B+
SDS:AS+
SDS:P+,AR+
Beam line Turbo Pump Type: Leybold
Compressor Type: CT8600(2ea)
Utiliy Supply: Top
Faraday: PFG
Angle: Auto
Soucre Assembly type: Cusp source
Y2K Status Completion: Yes
Below pumps are not included:
1) Terminal Dry Pump
2) Chamber Dry Pump
3) Chamber Cryo Pump
Installed in clean room
Powered off
1994 Vintage.
VARIAN E1000HP is an ion implanter & monitor equipment which utilizes VARIAN unique ion implantation technology. It is used in a variety of industries and applications, as it is capable of producing and controlling high-energy ions for a large variety of applications, such as for doping and mask optimization in semiconductor manufacturing, for surface modification of metals, and for ion beam analysis. It is the latest addition to VARIAN line of ion implanters, which have been designed over the past several decades to provide reliable and high-performance implantation systems. VARIAN E1000 HP system is a high-current, high-energy implanter designed for a broad range of applications. It is capable of delivering doses between 0.1 and tens of kilocoulombs, with beam current from 0.1 to 300 nanoamps and beam energies from 0.01 to 12 MeV. It has an optimized beam optics design which allows the user to quickly adjust the energy distribution of the beam, and its advanced beam transport unit ensures high-precision implantation. In addition, E-1000 HP has been designed with an integrated annular ion collector and detector assembly, as well as an advanced diagnostic platform which helps operators ensure optimal device performance. E1000 HP is heavily used in the semiconductor industry, as it is capable of highly reliable and uniformed ion implantation. It is also suited for applications where lower dose and lower damage implantation is desired. It is capable of producing highly accurate doping depths, such as those needed for effective doping control in typical CMOS devices. It is also used for mask optimization, where it helps to fine-tune the critical dimensions of a device without causing significant degradation at shallow depths. E1000HP has been designed with an eye towards its performance in an industrial setting. It has an integrated automation interface, which allows it to be interfaced with higher level computer systems and data collection facilities, making it easy to implement in existing semiconductor fabrication systems. It also offers a wide range of safety features, allowing customers to enjoy the level of protection they need for their machine. VARIAN E-1000 HP has proven itself to be an efficient and reliable implantation tool for a wide variety of applications, and it is sure to be an important asset for manufacturing facilities for many years to come.
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