Used VARIAN E11000090 #9110167 for sale

VARIAN E11000090 is a high-performance ion implanter and monitor which offers precise and powerful ion doping that's suitable for advanced semiconductor manufacturing processes. It is a single-ended, dedicated implanter and monitor that works with a wide range of ions. It is designed for high efficiency and speed, providing up to 60kW maximum output power. E11000090 comes equipped with advanced features such as its Liquid Source Helplines which automatically adjust nozzle centre points to optimize source position, and its Vacuum Transfer Line which is able to directly inject material into the vacuum. It also features a backside implant capabilities, allowing users to selectively implant different doping agents into different areas of the substrate. VARIAN E11000090 also comes with a Backside Ion Optical Monitor, which provides in situ monitoring of the implant progress. E11000090 can deliver doses of ions up to 10^15/cm2 with up to 10nm resolution, and is equipped with an external beam scanning system for ultra-fine control of the beam's dimensions. It offers powerful beam stabilization features to ensure accurate control of the implant dose and position. The implanter's Beam Current Monitor feature can also detect and identify particles of any size that may be present during the doping process. In addition to its powerful ion implanting capabilities, VARIAN E11000090 also offers an array of tools to analyse and monitor the implant process. Its Automated Alignment System automatically adjusts the position of the nozzle and substrate for optimised precision of the implant profile. It also features an Ion Flux Meter which measures and records the amount of implant ions absorbed by the substrate. The monitor's Multi-Channel Ion Flux Detector can detect multiple channels of ion flux from different angles, helping users ensure maximum uniformity and accuracy in their doping processes. E11000090 ion implanter and monitor is a powerful and reliable tool for delivering high-quality results. It offers tools that can help ensure accuracy and precision in doping processes, allowing users to achieve unparalleled performance.