Used VARIAN E11001051 #293671683 for sale
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VARIAN E11001051 is a high-end ion implanter and monitor designed for sophisticated implant and processing applications. It is equipped with a high-capacity ion source and has the capacity to process up to 350 wafers per hour in a single-shift. It contains a 25 kW particle beam that is capable of implanting ions; however, the wafer size is limited to 6 inches. The monitor is able to precisely measure the implanted ions and perform in-depth analysis that allows for better process control. E11001051 features a source-to-wafer handling equipment which is specifically designed to safely transport and process wafers without causing any damage. It also features a sophisticated beam steering system, allowing for precise implantation over an area that is greater than that of the wafer's surface area. Furthermore, the unit includes a unique ultra-high-resolution beam monitor for real-time monitoring of ion implantation parameters. This allows for more accurate implantation by providing real-time feedback and data. The monitor also displays process results in an easy-to-interpret format that can be used to compare results from different processing runs. In addition, VARIAN E11001051 has a user-friendly interface, making it easy for operators to interact with and control the implanter. The interface also allows for efficient set-up and operation of the implanter, reducing downtime and headache for operators. Moreover, it comes with automatic layer recognition, which allows for the same implantation across multiple different layers of the same wafer. Finally, the machine includes built-in safety features such as over-temperature and voltage control, as well as emergency shut-off. This ensures the implanter operates in a safe and reliable manner. Overall, E11001051 is an ideal choice for any application that requires precise and consistent ion implantation.
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