Used VARIAN E11001062 #293671682 for sale

VARIAN E11001062 is an ion implanter and monitor, typically used to deposit dopants into semiconductor substrates. Featuring advanced monitoring and control of high purity impurities, this device is designed for precision and productivity in order to meet the most demanding requirements of the semiconductor industry. E11001062 is a single-end horizontal ion implanter, which allows for a combination of simultaneous doping and profiling in a single process. It comes with a 1.5 MV accelerating voltage and uses single-ended full energy beams. The implanter also features adjustable drain, sweep, and tilt angles, allowing for unlimited flexibility and seamless adjustment according to user needs. VARIAN E11001062's advanced monitoring capabilities are designed to provide precise, real-time measurements of impurity concentration. An information screen displays condensed summaries of data needed to monitor system performance, providing a convenient way to diagnose and adjust doping profiles. The production environment can be fully automated with E11001062. Its chamber allows for remote control of charge, tilt angle, and profile parameters. The automation also reduces the time needed for setup and adjustments, and its advanced computer control capabilities increase the reliability and accuracy of dosage profiles. VARIAN E11001062 also features a variety of safety features. The implanter operates with near zero background contamination, and offers ambient and temperature-controlled environments to ensure constant high-quality deposition. The implanter is also compliant with ISO 9001 standards, and features an advanced security system to protect user data and confidential information. It also comes with built-in safety shut down features to ensure reliable operation under all conditions. In conclusion, E11001062 is an advanced ion implanter and monitoring system designed for precision, reliability, and productivity. With powerful features such as its adjustable drain, sweep, and tilt angles, advanced monitoring capabilities, automation, and safety features, the device is designed to meet the most stringent requirements for doping in the semiconductor industry.