Used VARIAN E11034134 #9230309 for sale

VARIAN E11034134 is an ion implanter and monitor used to transport ions into a substrate material. The machine is made up of several components which work together to create a complete equipment. These components include the ion source, the ion beamline, the primary and secondary accelerating systems, the energy and beam current controllers, the beam optics, the beam transport systems, the diagnostic and measuring equipment, as well as the end station. The ion source is used to produce and transport the ion beam. It is comprised of an ion beam generator, ion guide and an extraction system. The ion beam generator produces the ion beam by bombarding either a gas-filled enclosure, such as an ion deposition chamber, or a solid target material with high-energy electrons. This bombarding of electrons produces ions which are extracted and focused into a beam. The ion beamline is used to collect and transport the ion beam. It consists of a set of magnets that control and direct the beam, as well as beam diagnostic systems to monitor the beam's characteristics. The primary and secondary accelerating systems are then used to bring the beam up to the desired voltage and energy. The energy and beam current controllers are also used to maintain the energy and current levels of the ion beam. After this, the beam optics components are used to control the shape, size, and position of the ion beam on the substrate material. This is achieved by adjusting the focus and defocus approaches. Once the beam shape and size are set, the beam transport systems then move the beam from the ion source to the end station. The beam transport systems consist of various ion optical components, as well as vacuum systems which don't allow the ion beam to escape from the unit. The diagnostic and measuring equipment are then used to measure the beam's characteristics, including its voltage, current, energy, and position. Finally, the end station is where the beam is focused onto the substrate material, allowing for confinement and manipulation. Overall, E11034134 ion implanter and monitor machine is the complete package for ion implantation. It is capable of producing and transporting ion beams of any desired energy, current, and voltage for any given substrate material. The tool is also equipped with various diagnostic and monitoring components that allow for precision control and optimization of the implantation process. This asset is widely used across the industry and in academic research.