Used VARIAN E11071400 #149060 for sale

VARIAN E11071400 is an industrial ion implanter and monitor designed to operate in a variety of semiconductor applications. It allows users to deposit or implant up to 10ions per square centimeter into silicon wafers. The equipment features an optimized beamline and data collection system that makes it possible to vary the doping concentration of the silicon wafer during operation. This allows for precise control over dopant concentrations and enables the creation of optically superior semiconductor materials. E11071400 is composed of two main components: a mainframe and a beamline. The mainframe houses the ion source and monitor, the ion beam control unit, and the data collection machine. The ion predeposition chamber and the targeting scan platform are also included in the tool. The beamline is used for transferring the ions from the source to the target surface. It is comprised of an ion moderator, a mass analysis asset, an ion optical model, and an acceleration/deceleration component. The integrated data collection equipment enables users to monitor and control the dopant concentrations in the wafers and track the evolution of wafer properties during implantation. This greatly reduced the possibility of damaging the wafer during processing. The system also features an adjustable beam spot size, allowing the user to reduce the area of implanting. This helps minimize the contamination of material in adjacent wafers. VARIAN E11071400 is equipped with a range of safety systems to protect the implanter and monitor operations. These include a mechanical interlock unit to prevent accidental exposure, a safety shut-down machine if the predeposition chamber is opened, and an emergency stop feature. The high-speed data acquisition tool records implantation data quickly and accurately and is designed to operate with multiple windows, allowing the user to access a variety of data quickly and easily. The asset also provides a full range of data visualization tools, helping the user to understand the implantation process. Overall, E11071400 ion implanter and monitor is a reliable, high-performance model that can be used in a variety of semiconductor applications. It offers unmatched ion beam control, precise implantation control, and a wealth of safety features, making it an ideal choice for advanced manufacturers.