Used VARIAN E11077380 #9216111 for sale

VARIAN E11077380 is an electronic ion implanter and monitor equipment designed and manufactured by VARIAN Semiconductor Equipment. The system utilizes a reaction chamber with an integrated electronic braking and mass-analyzing unit to achieve precise and accurate control of the projectile intensity and energy distribution. E11077380 ion implanter is designed for use in ion implantation, which is a process used in semiconductor device fabrication to create surface doping layers and related structures. In this process, VARIAN E11077380 machine allows precise and accurate control of the beam intensity and energy distribution for the bombardment of material surfaces, allowing for the creation of highly precise and technologically advanced circuitry. E11077380 tool is equipped with integrated electronics designed to ensure the accurate control of the beam energy spread, intensity and spot size for a unique uniformity of the bombardment of materials under varying radiation and substrate parameters. The asset's integrated EPS (Energy Power Supply) delivers an adjustable range of energies between 100 eV and 30 kV. This delivers a highly efficient level of control for both implantation and etching applications. VARIAN E11077380 is also equipped with an integrated beam monitor model for the monitoring of the integral profile of the impinging ion beam. This equipment provides regular feedback on the uniformity of the bombardment profile, allowing for regular and automated calibration tasks. Additionally, the monitor allows the user to verify the intensity, energy spread and uniformity of the entire bombardment process. E11077380 is a modular system, allowing for a high level of flexibility and versatility in the implantation and etching of materials. The unit is available in three configurations tailored to specific processes and applications, including a high-energy version suitable for deep silicon doping, an intermediate-energy version suitable for medium-depth doping, and a low-energy version designed for surface etching. The machine is also equipped with a 60kW Fast High Voltage Pulsermaking the high-voltage switching fast and efficient. Overall, VARIAN E11077380 is a cutting-edge ion implanter and monitor tool optimized for precision implantation and etching applications in the semiconductor industry. Its integrated electronics and control features, coupled with high-efficiency energy and high-voltage pulsers, provide precise and accurate operation for highly efficient and reproducible implantation of materials and circuits.