Used VARIAN E11081190 #9107061 for sale

ID: 9107061
Vintage: 2004
Gas Card Assy ASH 3 SDS Gas 2004 vintage.
VARIAN E11081190 is an ion implanter and monitor that is used in the semiconductor manufacturing process. It functions as an analytical tool, delivering precise and repeatable doses of dopant ions that are used for fabrication of components used in electronic devices. E11081190 is equipped with an ion source that accurately controls and delivers the dopant ions required for a wide range of current devices. The internal source consists of a heated tungsten filament, an extraction system, and static ions to maximize ionization efficiency. The ion beam is accelerated to energy of up to 100 keV through a multi-aperature system to maintain a high current density, while reducing any beam spreading. The ion beam current density is monitored through Faraday cup that is capable of measuring currents of up to 1mA. The current response and the drift corrections auto-adjust the beam energy and current of the ion implanter to maintain the predetermined dose of ions, while simultaneously adjusting the beam envelope. VARIAN E11081190 has an auto-aligning feature that allows it to accurately align and scan the ion beam in a focused manner, improving the accuracy of implantation. This feature is essential for achieving high levels of precision in the manufacturing of complex electronic components. E11081190 also has an integrated computer system for user control and storage of data. It allows for imple monitoring and adjusting of the implanter parameters, such as dwell time and beam pitch, from any location. Its powerful software also enables the user to view, analyze and modify process recipes, administering or curing response curves and rapid beam adjustments. This ensures that the correct dosage of ions is precisely delivered. VARIAN E11081190 is capable of providing repeatable, precise, and reliable outcomes in nanosecond-scale determinations, reducing downtime and enabling an effective, highly accurate implantation process. It also ensures that high levels of quality and integrity is maintained in devices and components, guaranteeing their performance and features in the end-product.
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