Used VARIAN E11107177 #9265198 for sale

VARIAN E11107177 ion implanter & monitor is an advanced model of ion implanters designed for major semiconductor and silicon wafer production. It is commonly employed in the manufacture of integrated circuits, wafer-level packaging, and other micro-electronic components. E11107177 is a high throughput, DC biased, flood gun implanter equipment with medium to high beam currents ranging from 0.2uA to 400mA. It is capable of operating at low energies from 1 keV to 50 keV and features an integrated Faraday cup for measuring dose and dose rate at the source. The ion source of VARIAN E11107177 consists of an E-Beam Generator, E-Beam cup, and collector assembly. The E-Beam cup is fitted with two coaxial RF fields that allow for dynamic manipulation of ion beam energy and trajectory. This is beneficial as it allows for tuning of the process parameters to target specific components of a substrate's surface. E11107177 features dual guillotine slit assemblies and a uniquely designed extractor system which allows for rapid initiation and termination of an ion beam scan, reducing implantation time significantly. Furthermore, the unit can be fitted with up to four beam controllers, allowing for concurrent run of up to four processes. VARIAN E11107177 implanter has several safety features integrated into it. It is equipped with various sensors to monitor temperature and pressure, as well as a gas delivery unit to ensure safe functioning of the machine. E11107177 ion implanter & monitor is a comprehensive and versatile tool that can meet the stringent requirements of the semiconductor industry. With its inertial controlled beam scanning, dynamic manipulation of beam energies, and safety features, it has become a widely adopted solution to a wide variety of ion implantation applications.