Used VARIAN E11114360 #144136 for sale

VARIAN E11114360 is a high-performance ion implanter and monitor, designed for increased process reliability and yield. It is a versatile, general-purpose equipment, suitable for a variety of advanced applications and ideal for daily production runs. E11114360 features a fully-integrated beamline system with adjustable energy and current settings, allowing for precise and accurate implantation. The unit is equipped with sophisticated source contamination control and pollution protection systems, keeping the machine safe from hazardous particles and gases. Its addition of a high-precision gas-tight wafer transport tool further increases process reliability and throughput. The beamline asset is powered by a high-performance, digital scanning model and powerful beam-profile monitoring technology, which navigates the beamline and quickly modifies the implanting conditions. This advanced scanning equipment allows the operator to gain real-time feedback on the process, improving accuracy, efficiency and yield. VARIAN E11114360 also incorporates a digital beam shape optimization technology, allowing users to adjust the shape of the beam, tailoring the implantation to specific requirements. This innovation ensures that the implanted particles are homogenously distributed across the wafer, increasing process precision and yield. The system is controlled by a modern Windows-based control interface, making it easy to operate E11114360. This interface features intuitive features and controls, allowing operators to quickly adjust settings and monitor the implantation process. Further, the unit's advanced intelligence, control and diagnostic features provide extensive programming flexibility and enable the operator to access extensive data and analyze the process. VARIAN E11114360 is an impressive ion implantation and monitoring machine that combines advanced technologies, accuracy, efficiency and reliability for increased yield. Its comprehensive design makes it an ideal tool for a variety of high-precision implantation applications.