Used VARIAN E11114360 #293670842 for sale

VARIAN E11114360 is a high-performance ion implanter and monitor equipment. It is a type of ion implanter technology used in the semiconductor industry for the implantation of ions into substrates. The process is used to create precise patterns for the fabrication of semiconductor devices. The system is a high-vacuum platform that is designed to maintain vacuum with high precision. It has an automated control unit that enables accurate and consistent implantation conditions. The machine offers improved accuracy and repeatability over manual implantation, while also allowing for the use of multiple materials and configurations in a single run. E11114360 has a multi-capability monitor tool designed for inside cathode beam performance monitoring. This includes a flexible beam line architecture, capable of handling multiplexed or single particles, with measurements of no more than 4 microns. It has a pulse-to-pulse beam drive for uniform implantation depth. The asset features a high precision retarding field energy analyzer. It allows for accurate energy separation of non-pulsed ions through precise deceleration and measurement. It also has a position sensitive detector for automatic spot and trace implantation processes. The model is equipped with an in-situ ion current monitor that allows for the monitoring of ion bombardment on the target substrate. This helps to ensure precise implantation control and uniformity. It also offers improved reliability and accuracy over traditional methods of implantation. VARIAN E11114360 also features a separate device for wafer transport. This device allows for automated loading and unloading of substrates while maintaining vacuum integrity. This eliminates the need for manual interventions, making the process more efficient and cost-effective. The equipment is also equipped to receive external input from other devices, such as the ability to accept automated commands, diagnostic routines, and information from the central computer. This helps to ensure greater accuracy and control of the implantation process. Overall, E11114360 is a powerful and accurate ion implanter/monitor system designed for use in the semiconductor device fabrication industry. Its features include high-precision vacuum control, automated control of implantation parameters, flexible beam line architecture, retarding field energy analyzer, position sensitive detector, and in-situ ion current monitor. It is suitable for use in various production settings, and ensures greater reliability and accuracy in the implantation process.