Used VARIAN E11117551 #293639520 for sale

VARIAN E11117551 is an innovative ion implanter and monitor designed for use in semiconductor manufacturing applications. It is able to provide precisely controlled, uniform and repeatable implantation conditions for a variety of applications. E11117551 can be customized for any implantation process and loading parameters, giving it flexibility for different material implants. It is designed for both medium and high dose implantation, and offers high accuracy for both current and dose control. The device utilizes a 5 MHz 50 kHz self-excited nano-pulsed electron source to obtain the exact required dose, currents can range from 0.7 to 10,000 μA and energies from 3 to 100 keV. Clamping of implant parameters is achieved through the close monitoring and precision control of beam current, beam spread, and beam spot size. VARIAN E11117551 has a powerful vacuum chamber with two stage liquid nitrogen two stage cryo-pump, allowing for a rapid purging of the chamber. It is also equipped with a load-lock, allowing for quick and easy loading of the sample while maintaining a cleaner, free of contamination environment. The device has the ability to maintain its performance during heavy loads by monitoring chip rate, beam current, dose distribution, and total ion dose. Interlock safety features ensure proper safety operations, and a diagnostic monitor enables real-time diagnostics. E11117551 is designed for repeatable, reliable performance with a maximum latency of 0.5isec. Operators can monitor X-ray position by using its real-time X-ray monitor. It also enables chip rate control, using a set percentage of the operations per second to measure beam current and dose. This prevents dose buildup in implantation, offering repeatable and uniform doses. The device contains all necessary protection mechanisms for radiation safety and protection for both personnel and equipment, allowing for safe use in industrial environments. Its easy to use graphical user interface makes the operation of VARIAN E11117551 simple, allowing operators to monitor, adjust and perform implantation sessions, while remaining clear and concise. E11117551 has a wide range of features that make it stand out in the semiconductor industry. From its precision control and dose measurement capabilities, to its safety features and ultimate protection, VARIAN E11117551 provides reliable and high-performing operation for all your semiconductor implantation needs.