Used VARIAN E11321240 #293615588 for sale

VARIAN E11321240 is a high-end ion implanter and monitor designed for industrial, government and scientific applications. It is capable of creating a wide range of implant energies, angles and energies; and can be used for creating various types of highly-controlled implantation profiles. E11321240 features a pulsed or continuous titanium beam source that produces titanium ion currents of up to 400mA, resulting in an implantation depth of up to 5 microns. An integrated pressure-side power supply sends beam power and beam voltage in conjunction with implant implant profile parameters. The monitor of VARIAN E11321240 is designed to measure and monitor the ion implantation process. It can measure the beam currents and energies, the pulse widths and repetition rates, the beam scan patterns and magnifications, and a variety of other key implantation parameters. The monitor also shows the beam trajectory, the implant profile data, the implant values, and various other data points. It can also be used to check that all the stages of the implant process have been properly followed. E11321240 can be operated in either manual or automatic mode. Manual mode allows the user to input parameters and allows for greater control over the implant process. Automatic mode allows for an automated implantation process, making it ideal for production environments. The monitor also offers an array of pre-defined parameters that the user can customize to the requirements of their implantation process. The unit measures 54 cm x 98 cm x 20 cm, and weighs in at just over 130kg. Despite its robust design, VARIAN E11321240 is relatively easy to install and run, and requires very little maintenance. Overall, E11321240 is an efficient and effective ion implanter and monitor ideal for industrial, government and scientific applications. Featuring remarkable implantation control and a powerful monitor, VARIAN E11321240 makes implantation processes simpler, more predictable and more accurate than ever before.