Used VARIAN E17179550 #9002204 for sale

VARIAN E17179550 is a state-of-the-art ion implanter and monitor designed to produce ions to be implanted into a substrate such as a semiconductor wafer. It is equipped with a 25 MHz RF source, a wide range of acceleration voltages (50 to 400 KV), and an Isotope Separation System. Its advanced high-resolution Faraday Cup Monitoring enables precise control and adjustment of dose rates to provide uniform ion implantation through the whole wafer. E17179550 also incorporates a high throughput, high quality ion collector that provides accurate measuring of beam size and energy distribution, as well as effective beam diagnostics. Another important feature is its in-vacuum sample heater that can evenly heat the wafer to optimal temperatures prior to implantation. VARIAN E17179550 is highly reliable and thermally stable, with a low magnetic field tolerance capacity. This makes it particularly appropriate for the production of small or large batch implantations with consistent results, resulting in better yields from substrates and lower costs for the customer. Its integration into the production line is simple, and the unit requires minimal operator intervention for proper operations and maintenance. E17179550 is a reliable, high-performance and sophisticated ion implanter and monitor, suitable for a variety of implantation technologies in the semiconductor and optoelectronic industries.