Used VARIAN E17220280A #9001753 for sale

VARIAN E17220280A is a multifunctional ion implanter and monitor that offers cost-effective and reliable solutions to the growing semiconductor market. The equipment combines sophisticated hardware and software to produce high-accuracy, high-throughput ionizations. It can serve the needs of analytical testing and wafer production, as well as those of mainstream and advanced semiconductor industries. E17220280A ion implanter uses magnetic fields generated by high-power electron guns to precisely ionize source materials. This process is carefully controlled and monitored via software, allowing the user to control the implantation angle, particle energy, implant dose, and aperture settings. The result is a highly precise and reproducible implanted surface with low level of defects. The system is equipped with a state-of-the-art temperature control unit, ensuring more reliable and consistent results. An additional large liquid nitrogen pool can achieve optimum cooling of the exposed materials, allowing higher accuracy and throughput even in harsh environments. The machine also features advanced beam control for better accuracy and a real-time dose monitor to ensure that the implants stay within the desired parameters. The monitor track of the tool is capable of screening the substrates for defects and impurities, which helps in the development of high-quality semiconductors. The monitor also provides detailed metrology information on wafer topography or profile, thickness, curl, flatness, grain size, etc. Additionally, a range of in-situ cleaning procedures can be performed to ensure quality and continuity of results. The asset architecture is open and modular, allowing for customer-specific upgrades and adjustments. The ion implanter includes safety shields, enabling the user to work in the presence of high-energy beams. A variety of standard interfaces provide further flexibility. In conclusion, VARIAN E17220280A ion implanter and monitor provides accurate and reproducible high-speed ionization for semiconductor production. Its sophisticated technology ensures top-level performance, while its large liquid nitrogen pool and real-time metrology model allow for reliable, high-quality implantations. This equipment lets the user control their implantation process with minimal effort and risk, providing greater flexibility and confidence in their projects.