Used VARIAN E19000432 #293633105 for sale

VARIAN E19000432
ID: 293633105
Filament power supply.
VARIAN E19000432 is a state-of-the-art ion implanter and monitor that is capable of providing high levels of precision in the implant process. It uses a large number of precision-engineered components to control the ion beam that is necessary for implanting into a substrate or semiconductor material. At its core, E19000432 features an advanced ion source that provides high-precision, 3-dimensional beam control. This allows for greater accuracy, faster throughput, and higher yields. It also features a modular ion source architecture that is designed to meet customer requirements. The equipment uses an array of sophisticated software tools to accurately determine the amount, energy, and size of the implanted particles. In addition to its ion source, VARIAN E19000432 also features an advanced ion monitoring platform. It comprises of a high-precision real-time ion optics, a high-speed computer-controlled mass analysis system, an integrated scanner and monitor, and an integrated laser unit. This machine offers users complete control and monitoring of the beam trajectory and particle size, ensuring high yields and better products. For safety, E19000432 features a range of interlocks and safety features to ensure minimal risk of damages to personnel and equipment. Its safety features include an integrated fire detection tool, sound alarms, and a thermocouple-based temperature monitoring asset. Additionally, the model is designed to automatically shut down when certain safety thresholds are exceeded. In short, VARIAN E19000432 is a powerful, reliable, and highly flexible ion implanter and monitoring equipment. Its advanced components are capable of achieving remarkable precision, allowing for implant results of impeccable quality. Moreover, its various safety features ensure personnel and equipment safety at all times. With its versatility and reliability, E19000432 is an excellent choice for any application requiring precision-controlled ion implantation.
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