Used VARIAN E19000432 #9192436 for sale

VARIAN E19000432 Ion Implanter & Monitor is an advanced tool used for the process of implanting ions into semiconductor wafers. Designed to be extremely reliable and precise, this advanced machine is used for a variety of industrial and research applications, such as implanting ions for negative charge accumulation, adding dopants for controlled doping of semiconductors, and production of high-speed memory devices. E19000432 utilizes a multistage vacuum equipment, which includes four electrodes (Magnetron Source, Channel plate, Anode and Collimator). The machine is powered by a high voltage electron gun which can produce up to 12 KV. A current flow control system, comprised of a power amplifier, resolves the voltage drop, which occurs in the gap between the magnetron and channel plate. The unit also includes a fully automated control unit, and advanced monitoring systems, which provide precise monitoring of the ion implanting environment. The advanced monitoring machine can detect a wide range of parameters, such as the current mode, dose rate, ion gun angle, and acceleration voltage. A special ion beam source is also included, which can project a spot size of up to 9mm, to ensure maximum accuracy and accuracy in the implantation process. The application of such powerful systems has resulted in improved production yields, better yields in integrated device fabrication, as well as lower cost of operation. Additionally, VARIAN E19000432 has a long service life, and low maintenance cost, due to minimal downtime and consistently high performance. In conclusion, E19000432 Ion Implanter & Monitor is an advanced and reliable tool which is used for the process of implanting ions into semiconductor wafers. With its superior monitoring systems, high voltage electron gun, and automated control unit, the machine is a preferred choice of many industries and research laboratories, due to its consistent high performance and long service life.