Used VARIAN E19001300 #158850 for sale

VARIAN E19001300 is an advanced ion implanter and monitor designed for semiconductor device production. It is capable of generating up to 20 kV implant energy and up to 6.5 mA of current capacity to make heavier doping of ion beams possible. This ion implanter and monitor offers superior performance and control, along with a reduced set-up time, to process uniform dopant layers that contribute to improved device yield and performance. E19001300 is designed for high-quality, uniform ion implantation with a wide range of beam energies, current levels, and angle spreads. Its digital signals allow for native control of beam parameters and minimize damage caused by uncontrolled high-energy beams. The equipment is equipped with anbuilt-in visor which can be activated to monitor the ion beam in real-time, providing a complete view of the sample surface while allowing the operator to maintain optimal beam control without sacrificing process results. In addition to its ion implantation capabilities, VARIAN E19001300 also supports various types of chemistry analysis and process characterization. These capabilities include advanced cross-section analysis of the samples implanted, elemental mapping for improved process understanding, and automated process monitoring for improved process repeatability over time. Through these features, the system can generate both complete top-down and cross-sectional multiplex datasets to reveal important device characteristics at the atomic level. E19001300 also offers an easy-to-use user interface and process control software. This unit includes a robust library of subroutines, enabling users to quickly recall implantation recipes and parameters to save time. To facilitate efficient integration in existing production lines, the machine includes an integrated safety tool, remote-controlled operation and asset self-diagnostics. In conclusion, VARIAN E19001300 is a reliable and powerful ion implanter and monitor designed to ensure optimal quality and throughput for device production. It offers high-precision control over beam parameters, automated process monitoring, and a robust user interface for ease of use. This model is highly reliable and provides reliable results, making it an ideal choice for efficient device fabrication.