Used VARIAN E19002370B #149061 for sale

VARIAN E19002370B is an ion implanter and monitor used in process semiconductor device manufacture. It is an advanced tool with multiple features that allow for precise adjustment, monitoring and control of the ion implantation process. The main components of the unit consist of an RF generator, an ion source, a beamline, optics, a scanning equipment, and an environmental control unit (ECU). The high-voltage generator provides the energy needed to accelerate ions as they travel down the beamline. The ion source, located at the end of the beamline, is designed to produce a beam of ions with the desired energy and dose. The scan system, which consists of a motion stage and control electronics, is used to control the beam deflection and position. The optics are used to optimize the beam shape before it enters the substrate. Finally, the environmental control unit maintains the process temperature and pressure during the implantation. E19002370B is also equipped with a monitoring and control unit, which enables operators to precisely adjust all parameters during the implantation process. It allows them to set the energy of the beam, the gas pressure, the dose rate and the scan time. Furthermore, the machine can be programmed to adjust these parameters depending on the type of substrate being imploded. The unit also features a multi-parameter monitoring tool to ensure a successful implantation and to provide detailed information about the process. This asset records and displays various parameters, such as current density, dose, wall current, beam current, and beam energy. In addition, the unit can be remotely operated to allow multiple implants to be performed simultaneously. VARIAN E19002370B is a powerful and accurate implant and monitoring tool, capable of handling all types of silicon wafers. By providing precise control and monitoring of the implantation process, it ensures the highest quality in all semiconductor devices.