Used VARIAN E19002442-2 #140342 for sale

VARIAN E19002442-2 is a state-of-the-art ion implanter and monitor system capable of performing implantations and other related processes with high precision and accuracy. It consists of a source injector, source extractor, particle beam monitor, substrate holder, an elbow chamber, a low energy beam transport, a beam step monitor and an energy selector, which are all controlled by the Central Control Panel. The source injector is used to inject ions into the beam. It consists of a filament and an electrode. The filament is used to generate the positive ions and direct them into the electrode, which can be adjusted to vary the beam intensity. The source extractor helps to accurately extract ions from the beam and filter out unwanted particles. The particle beam monitor directs the ions at desired positions and the substrate holder holds the substrate in the right positions during implantation. The elbow chamber is the main chamber in the system, featuring a rotatable chamber which allows precise manipulation of the beam while maintaining a high beam current. The low energy beam transport is a beam transport system that can be adjusted to direct and control the beam angles and angles of incidence. The energy selector is an energy calibrator used to accurately set the energy of the implanted ions. Lastly, the beam step monitor is used to measure the dose deposition rate of the ion implantation. All these components are connected to the Central Control Panel for full control of the ion implanter. E19002442-2 is perfect for a range of implantation processes, from low to high energy levels, from low to high doses, and from low to high temperatures. It is reliable and easy to use, making for a perfect choice for efficient and precise ion implantation.