Used VARIAN E19002442-2 #9037843 for sale

VARIAN E19002442-2 is a state-of-the-art ion implanter and monitor, designed for precise implantation of ions into materials for numerous applications in semiconductor and microfabrication industries. It is an automated device based on a field-emission ion source and an in-line beam line with four fully-programmable analyze and simulation chambers. The implantation process is electronically-controlled, which allows for precise implantation of selected ions, without the need for manual intervention. E19002442-2 is equipped with a high-resolution ion optical system which provides a precise control of the ion beam during implantation, ensuring that the ions are implanted accurately to the target depth. It also features an in-line beam line, which is used to monitor the ion implantation process. This includes a spectrometer, a collision filter, and detectors which measure the beam parameters and allow for automated analysis and feedback during implantation. VARIAN E19002442-2 is capable of implantation of a large variety of elements and cocktails containing anywhere between 1 and 8 elements. It can produce a wide range of implantation energies over the range of 0-4 keV and can produce doses of 1×1015 to 5×1018 per cm2 per second. It also features a well-designed safety system with an E-PROM, which stores all the operating parameters beforehand and has additional protections to prevent malfunction. E19002442-2 provides high-precision ion implantation, with a uniform dose distribution, low-voltage acceleration, accurate beam scanning, and high accuracy in beam current. The device can be used in the research and development of silicon implanted substrates, as well as for production of wafers in the field of MEMS and microlithography. It also is used in the mass production of chips in VLSI and ULSI microelectronics. VARIAN E19002442-2 offers improved throughput when compared to the industry standard implanters, thanks to its powerful digital systems. It is currently used worldwide in a variety of applications requiring high-precision ion implantation, including the manufacture of high-quality integrated circuits, semiconductor wafers, and other microfabrication materials.