Used VARIAN E19013590 #148786 for sale

VARIAN E19013590 is a state-of-the-art ion implanter and monitor designed for semiconductor device fabrication applications. It combines sophisticated ion implantation and monitoring technology to enable cost-efficient, high-performance operation across a wide variety of applications. The equipment utilizes a new all-in-one beam spot monitoring technology that can measure the beam diameter in real time, providing reliable, repeatable results. The system is equipped with a 1000x1000mm scan area and a 500mm Wafer stage suitable for a variety of device layouts and processing times. It consists of a 400mm low-energy ion source which is used to generate the beam of desired ions, an optical filter and a beam monitor to ensure optimal beam intensity, spread and transmission. It also has an integrated process control unit with a feedback loop that allows users to adjust process parameters during implantation. The process control machine also includes a range of preset templates that can be customized to users' specific process needs. E19013590 is designed to provide optimized quality and throughput in medium to high dose ion implants. It is capable of producing a beam dose rate from 0.1 to 10keV, with a maximum beam energy of 400keV. The tool is capable of doping up to 20 layers at the same time with exact beam dose control and high energy pulsed mode up to 50 pulse per second. It also features a range of sample support adapters for implantation of various sample sizes and materials. In addition, the asset is designed for high reliability and safety with its integrated locking mechanism which prevents accidental ion implantation, as well as a forced blanking off of the beam when an obstacle is encountered. It also includes continuously monitored anode temperature, digital beam monitors and CPU temperature monitoring systems which ensure safe and reliable operation. Furthermore, the model is compliant with the latest safety standards, including CE, ISO 13485 and RoHS. Overall, VARIAN E19013590 is a sophisticated, high-performance ion implanter and monitor that provides users with a cost-efficient and reliable solution for semiconductor device fabrication processes. Its state-of-the-art technologies and safety features ensure reliable operation and quality results in implanting a wide range of materials.