Used VARIAN E220HP #9279486 for sale

VARIAN E220HP is an ion implanter and monitor used in the semiconductor manufacturing process. It is a revolutionary piece of equipment that is capable of quickly and precisely implanting a variety of implant ions into substrates when used in conjunction with a high-pressure gas source. VARIAN E220 HP includes a monitor for accurately measuring the implanted ions and an alignment system that allows for the precise placement of the ions. E 220 HP features an electron bombardment (EB) source that provides the energy to bombard the substrate surface with the implant ions. This energy level can be adjusted to achieve the desired ion concentration and energy levels, allowing for tight control of the implanted ions. Additionally, the entire system can be monitored in real time with an advanced laser alignment system. This allows the implanter to quickly and accurately align the ions with the substrate surface, providing an increased degree of control over the implantation process. VARIAN E 220 HP employs secondary emittance technology to ensure a consistent and reliable beam when implanting ions onto a substrate. This technology provides the ion implanter with a uniform beam of ions, ensuring that the implanted ions are evenly spread over the target surface. Additionally, E220 HP offers a variety of different implantation strategies that can be used to further refine the implanted ions. These strategies range from avalanche detune to Klystron acceleration and provide a range of capabilities for specific implantation purposes. Finally, E220HP utilizes a high-speed processor that can run multiple implantation sequences simultaneously, allowing for parallel implanting of multiple substrates. This processor also allows the implanter to reach ultra-high implantation speeds of up to 500 msec. Additionally, it is capable of storing large volumes of data, allowing for easy recall and automated analysis of data on implantation maps and results. Overall, VARIAN E220HP is a powerful and versatile ion implanter and monitor that provides enhanced control and accuracy in the semiconductor manufacturing process. By providing a high level of customization and parallel implantation, VARIAN E220 HP ensures that all substrates are accurately and uniformly implanted with the desired ions, allowing for superior results. With its high processing speeds and data storage capabilities, this ion implanter and monitor is an invaluable tool in the semiconductor industry.