Used VARIAN E220 #9069279 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9069279
Vintage: 1999
Ion implanter
Soft Ver. Ver 12.2
Gas Box HP Gas Box
Auto Decel YES
Scan Post Scan Chamber
Scan Generator TERK Power Supply
Wafer Size 8 Inch
Wafer Clamp ESC
Cryo Pump Chamber - CTI
Load Lock Pump CTI Cryo Pump(CT250F)
Compressor 8500
Wafer Handler Standard Type
Main Monitor LCD
Exhaust Box Standard
Roplat Cable Standard Type
Source Head Bernas
Turbo Pumps:
Ion Source: Pfeiffer TMH101P
Analyzer: Pfeiffer TMH260
Beamline: Pfeiffer TPS301
Dry Pump:
Ion Source: Edwards iQDP80
Stage: Edwards iQDP40 + QMB250
Load Lock: Edwards iQDP80
Bas Bottle #1 PH3 - SDS
Bas Bottle #2 AsH3 - SDS
Bas Bottle #3 BF3 - High Pressure
Bas Bottle #4 Ar - High Pressure
Gas Interlock:
Leak Current
Exhaust
Gas 2nd High Pressure
Currently warehoused
1999 vintage.
VARIAN E220 is an ion implanter and monitor equipment providing highly accurate ion implantation to create a variety of implant profiles for wafers and substrates. VARIAN E-220 is designed to provide consistent reliable performance and is capable of handling a wide range of wafer sizes and substrates. The system features an ion source consisting of a lanthanum hexaboride (LaB6) gun with extended life. The gun is suspended in a vacuum chamber and is operated with computer-controlled power and grid adjusters to achieve optimum ion implantation conditions. The unit also includes ion implantation monitoring and control components such as interlocks, pressure sensors, and a digital current meter to ensure accurate and repeatable implantation. E 220 allows precise control over implanted dose rate and analyte size, guarantying efficient, accurate implantation. The machine allows for up to 10 independent chambers capable of applying implantation profiles ranging from 0.0005 inch to 0.8 inches thick. VARIAN E 220 utilizes high-voltage precision devices for both injection and extraction of the ion species, resulting in high ion uniformity and a very low ion implantation energy spread. E220 also has many safety interlocks including, but not limited to, a reduced chamber pressure in case of emergancy, an emergency shutdown in case of power failure, and a chamber interlock tool which detects accidental opening of doors or windows. The asset also has particle detectors to alert operators to any dangerous, airborne contaminants present. The model provides a user-friendly interface and a wide range of alarms for user convenience and protection, including status alarms, current alarms, end-of-run alarms, chamber alarms, equipment malfunctions alarms, and sequence alarms. All of these alarms help ensure a safe and successful implantation process. E-220 offers an excellent level of control and accuracy while providing excellent user friendliness and safety. The system provides precise, repeatable implantation and is capable of handling a wide range of wafer sizes and substrates. The unit is also capable of providing long life components, precise implantation control, and a host of safety interlocks. This provides the user with a reliable and safe implanter machine.
There are no reviews yet