Used VARIAN E220 #9237371 for sale

VARIAN E220 is an advanced ion implanter and monitor designed to precisely deposit areas of charged particles into a semiconductor material in order to alter its electrical properties. The ion implanter is highly versatile and can be used for a variety of applications in industrial and research settings. The main mechanism of VARIAN E-220 is the ion source, which is used to produce a steady stream of charged particles from a gas or solid source. This ion beam is then steered and accelerated by a series of magnetic lenses and pulse power supplies, which determine the intensity and energy of the beam's particles. This beam is then directed and focused onto a target material or substrate, resulting in a precise deposit of positively or negatively charged particles into the target material. E 220 features a number of advanced monitoring and controlling systems for ensuring that the implanting conditions are consistent and accurate. This includes a compensation system for compensating for variations in the beam current, a scan detector for scanning the sample area to measure the surface profile, and a control system for setting the beam intensity and energy level. Additional features include an in-situ analysis system for monitoring the particles in the beam, and a central processing unit (CPU) for controlling the operating parameters and data logging. VARIAN E 220 is a highly efficient and reliable tool for implanting ions onto substrates for a range of applications. It is capable of producing high precision implants, which can be used for a variety of semiconductor processes, such as doping, activating, and passivating thin films. The monitoring systems provide greater control over the implant parameters, such as dose, energy, and spot size, ensuring consistent high-quality results. The ease of use and range of features makes E220 an ideal choice for industrial and academic processes.