Used VARIAN E220 #9257302 for sale
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ID: 9257302
Wafer Size: 8"
Vintage: 1994
Ion implanters, 8"
Type: Medium current implanter
SEIKI STP-1000C Vacuum turbo I/S
SEIKI STP-300 ANA Turbo
SEIKI STP-1000 B/L Turbo
Vacuum rough I/S: EBARA 40 x 20
Stage: EBARA 50 x 20 UERR 6M
Load lock: EBARA A30W
Gas box: HP type
(4) Gas bottles:
PH3-s
AsH3-s
BF3
Busshing EHP type
Source head bernas
Arc power supply CPI
Mirror readback
Reducer: (2) Steps
Scan post scan chamber
Scan generator trek PS
Linear servo copley
Wafer clamp mechanical: 6 Points
Roplat: (Controller P/N:E11048880)
Tilter: (Controller P/N:E11048890)
Travelling faraday TVL
Main monitor flat-panel
Decel auto
HV Probe
Exhaust leak detect
Gas Interlock Unit
Interface PD
No vaporizer
1994 vintage.
VARIAN E220 is an advanced ion implanter and monitor manufactured by VARIAN Semiconductor Equipment Group. Specifically designed to increase productivity and reduce costs, VARIAN E-220 enables semiconductor chip manufacturers to rapidly produce high-performance, low-power devices. E 220 Implants and Monitors feature high-quality precision implants with low-noise levels and uniformity while remaining relatively compact. VARIAN E 220 features two independent drive systems, a full duplex ion source and a high-current electron source, to achieve optimal performance. This technology enables the implantation of both ion and electron beams into the chip. Additionally, E220 utilizes an easy-to-use graphical user interface that allows for accurate, real-time monitoring of implant conditions. E-220 features beam-current ranges up to 25mA, voltage ranges up to 950V and energy ranges up to 25keV, enabling the delivery of a higher range of ion species. The implanter also features a three-electrode configuration, a deposition monitor, and a tiltable, automated substrate masker with up to eight levels of substrate protection. This enables the precise delivery of ions and electrons without over-penetration. VARIAN E220 is equipped with an advanced programmable delivery system, able to control a wide variety of variables, such as the total beam current, the timing between pulses, and the total dose delivered. It also includes automated plasma cleaners and pre-programmed routines that allow for higher throughput rates and improved productivity. Additionally, VARIAN E-220 features a predictive maintenance system designed to identify potential areas of wear and giving early warning of any anomolous operation conditions, increasing its reliability and uptime. E 220 is a reliable and precise ion implanter and monitor, perfectly suited for production environments requiring high-quality devices. Featuring both automated and manual operation, as well as sophisticated safety and control systems, VARIAN E 220 delivers the ultimate precision and efficiencies to a variety of semiconductor chip manufacturers.
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