Used VARIAN E220 #9262460 for sale

VARIAN E220 Ion Implanter and Monitor is a high-performance appliance designed for the implantation of boron or phosphorus into semiconductor wafers. It utilizes the latest technologies in ion accelerator design to provide excellent process control and precision. The ion implantation process requires high power, low voltage switching and precise control of the beam intensity and focusing parameters. VARIAN E-220 is a fully programmable, modular machine with a variety of options, including an energy selection equipment and beam rastering. The energy selection system features a P2 electrostatic scanning unit that allows for multiple energetic ions or ions with different kinetic energies to be implanted at the same time. The raster machine lets the user to easily adjust the beam parameters and scan the surface of the wafers. The beam parameters can be tailored to specific applications, such as ultra shallow junction implants, or ions with low fertility. E 220 also features a high-resolution PML500 charge coupled device camera tool. This asset uses a position sensitive detector to accurately monitor the ion implantation process. The camera can be used to detect and diagnose any changes in the implant profile. The control electronics package of E220 is state-of-the-art, utilizing a variety of software parameters and including the Integrated Process Control (IPC) model. The IPC equipment provides a comprehensive set of features to monitor and control the ion implantation process. This system can be used for automatically controlling the acceleration voltage, beam intensity, beam raster or area, and dose rate. VARIAN E 220 also includes a pulse generator unit and an energy control unit. The pulse generator produces a voltage square wave which determines the frequency and total time of the beam operation of the ion implanter. The energy control unit provides precise control of the beam energy and ensures that the beam energy remains constant during the process. Overall, E-220 Ion Implanter and Monitor is a powerful and reliable implantation tool. It provides excellent process control and precision, as well as features that ensure any changes in the implant profile are detected and diagnosed. It is a valuable tool for semiconductor and the latest technologies in ion accelerator design.