Used VARIAN E220 #9272647 for sale

VARIAN E220 ion implanter and monitor is a high-precision, state-of-the-art tool that has been designed to implant and monitor the implantation of dopants into semiconductor wafers. This machine has been designed to be cost-effective yet robust and to accurately monitor and implant dopants at a uniform rate and depth into the desired substrate. VARIAN E-220 has an adjustable ion acceleration and deceleration to give the user the best possible dose uniformity for more precise implantations and monitors. This machine is able to analyze up to sixteen wafers simultaneously, and has an adjustable ion implanter beam with a maximum implantation current of up to 200mA and a variable beam spot size up to 4mm in diameter. E 220 also has a sample tracker and table feeding system that ensures wafer placement and orientation accuracy. It also has an advanced emissive feedback system for accurate implantation. VARIAN E 220 has an integrated On-Cell Implanter (OCI) to optimize the implantation depth by controlling the ion beam current and deceleration at the sample position. This OCI has been proven to provide uniform doping concentrations and dose profiles over the entire wafer. This machine also has an OCI monitor, which can be used to monitor ion implantation in real-time with a two-pulse period. E-220 ion implanter and monitor is designed to be highly energy-efficient with optimal use of resources. By utilizing in-situ monitoring and controlling the implanter beam current, this machine results in improved process control and higher production yields. E220's data acquisition and analysis capabilities also provide invaluable data that can be used to improve repeatability and reduce production costs.