Used VARIAN E220 #9361402 for sale

ID: 9361402
Wafer Size: 6"
Medium current ion implanter, 6" Signal tower: Front panel Single wafer E-Chuck Loadlock: Left / Right VAT Gate valve missing Vacuum: Ion source chamber Beam line chamber End station chamber Pumps: Terminal: Dry pump Turbo pump (3) Controllers E/S Chamber: Dry pump Dry pump / Booster pump Cryo pump L/L Turbo pump Maker / Model / Class EDWARDS / QDP80 / Terminal dry pump PFEIFFER / TPH 1600 / Source TMP PFEIFFER / TCP 5000 / Source TMPC PFEIFFER / TPH 510 / Resol TMP PFEIFFER / TCP 310 / Resol TMPC PFEIFFER / TPH 240 / Beam line TMP PFEIFFER / TCP 121 / Beam line TMPC CTI / 250F / End station C/P CTI / 9600 / Compressor VARIAN / CTI100 / Loadlock TMP VARIAN / CTI100 / Loadlock TMPC EDWARDS / QMB250 + QDP40 / End station dry Process gas: Type / Gas / CGA Outlet HP / AsH3 / CGA 577 HP / PH3 / CGA 578 HP / BF3 / CGA 579 HP / Ar (N2) / CGA 580 High voltage range: Extraction power supply: 0 keV~40 keV Acceleration power supply: 0 keV~180 keV Power supplies (Assembly): Filament Vaporizer Source magnet Extraction Extraction suppression Analyzer magnet Mirror power supply (Decel) (2) Quadrupole magnets Scan generator controller Mirror Dipole lens magnet Acceleration Acceleration suppression Scan trek power supply Isolation transformer assembly Mirror read back assembly: 60 keV Controller (Assembly): Left arm servo Right arm servo Vacuum gauge Scan faraday Platen tilt servo Vertical lift orienter Uniformity Liner motor servo amp Orienter Left and right elevator Dose integrator DI Temperature monitor Options: Beam reducer Decel Gas box type: HP Source type: Bernas Faraday type: VARIAN Scanning faraday Utilities: Air: 100~150 PSI N2: 40~150 PSI Cooling water: 60~150 PSI Temperature: 4°C~21°C Power supply: 208 VAC, 3-Phase, 5-wires, 43.2 kVA, 120 FLA.
VARIAN E220 is a powerful ion implanter and automated monitor designed for demanding ion implantation applications. Its easy-to-use features and systems allow for the accurate control of implantation process parameters, resulting in high quality and throughput of substrates. The equipment offers a wide variety of process settings and capabilities, including single or multi-ion, variable voltage, external beam setup, plasma sheets, and a range of other sophisticated features. Its sophisticated hardening tools are designed to implant dopants into the substrate in high concentrations, without damaging the substrate material. The system also offers a versatile implantation process, allowing it to handle a wide range of materials. It comes equipped with a built-in high-density sensor measuring ion current density and energy. The sensor can detect the ion density in the substrate to maintain the desired implantation rates. VARIAN E-220 has an efficient environmental control in order to ensure the ideal conditions for the substrate. Its advanced environmental control will reduce the amount of energy used during implantation and improve the accuracy of the results. The unit also features an ion source that is powered by a direct current, eliminating the need for forming gas and reducing the risk of contamination. The source contains a high-efficiency focusing machine which helps stabilize substrate temperature. Its sophisticated beam line control makes E 220 an ideal choice for a reliable implantation process. Specialty hardware, such as electrostatic deflectors and ion guides, provide precise control of the beam and ensure uniformity of the implantation. The automated beam line control will automatically adjust the beam size and shape as needed, resulting in precise and effective implantation of the desired ions. The tool comes with powerful software that makes the process user-friendly and convenient. Data logging, advanced diagnostics, and other monitoring features make it easier to track and analyze the progress of the implantation. The software also supports advanced statistical analysis and verifiable records. VARIAN E 220 is a versatile and reliable asset for advanced ion implantation needs. With its wide range of features and capabilities, it is well-suited to tackle demanding implantation requirements that involve a variety of materials. Its sophisticated hardware and software make it an ideal choice for achieving varied results at high precision levels.
There are no reviews yet