Used VARIAN E220 #9361402 for sale
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ID: 9361402
Wafer Size: 6"
Medium current ion implanter, 6"
Signal tower: Front panel
Single wafer
E-Chuck
Loadlock: Left / Right
VAT Gate valve missing
Vacuum:
Ion source chamber
Beam line chamber
End station chamber
Pumps:
Terminal:
Dry pump
Turbo pump
(3) Controllers
E/S Chamber:
Dry pump
Dry pump / Booster pump
Cryo pump
L/L Turbo pump
Maker / Model / Class
EDWARDS / QDP80 / Terminal dry pump
PFEIFFER / TPH 1600 / Source TMP
PFEIFFER / TCP 5000 / Source TMPC
PFEIFFER / TPH 510 / Resol TMP
PFEIFFER / TCP 310 / Resol TMPC
PFEIFFER / TPH 240 / Beam line TMP
PFEIFFER / TCP 121 / Beam line TMPC
CTI / 250F / End station C/P
CTI / 9600 / Compressor
VARIAN / CTI100 / Loadlock TMP
VARIAN / CTI100 / Loadlock TMPC
EDWARDS / QMB250 + QDP40 / End station dry
Process gas:
Type / Gas / CGA Outlet
HP / AsH3 / CGA 577
HP / PH3 / CGA 578
HP / BF3 / CGA 579
HP / Ar (N2) / CGA 580
High voltage range:
Extraction power supply: 0 keV~40 keV
Acceleration power supply: 0 keV~180 keV
Power supplies (Assembly):
Filament
Vaporizer
Source magnet
Extraction
Extraction suppression
Analyzer magnet
Mirror power supply (Decel)
(2) Quadrupole magnets
Scan generator controller
Mirror
Dipole lens magnet
Acceleration
Acceleration suppression
Scan trek power supply
Isolation transformer assembly
Mirror read back assembly: 60 keV
Controller (Assembly):
Left arm servo
Right arm servo
Vacuum gauge
Scan faraday
Platen tilt servo
Vertical lift orienter
Uniformity
Liner motor servo amp
Orienter
Left and right elevator
Dose integrator
DI Temperature monitor
Options:
Beam reducer
Decel
Gas box type: HP
Source type: Bernas
Faraday type: VARIAN Scanning faraday
Utilities:
Air: 100~150 PSI
N2: 40~150 PSI
Cooling water: 60~150 PSI
Temperature: 4°C~21°C
Power supply: 208 VAC, 3-Phase, 5-wires, 43.2 kVA, 120 FLA.
VARIAN E220 is a powerful ion implanter and automated monitor designed for demanding ion implantation applications. Its easy-to-use features and systems allow for the accurate control of implantation process parameters, resulting in high quality and throughput of substrates. The equipment offers a wide variety of process settings and capabilities, including single or multi-ion, variable voltage, external beam setup, plasma sheets, and a range of other sophisticated features. Its sophisticated hardening tools are designed to implant dopants into the substrate in high concentrations, without damaging the substrate material. The system also offers a versatile implantation process, allowing it to handle a wide range of materials. It comes equipped with a built-in high-density sensor measuring ion current density and energy. The sensor can detect the ion density in the substrate to maintain the desired implantation rates. VARIAN E-220 has an efficient environmental control in order to ensure the ideal conditions for the substrate. Its advanced environmental control will reduce the amount of energy used during implantation and improve the accuracy of the results. The unit also features an ion source that is powered by a direct current, eliminating the need for forming gas and reducing the risk of contamination. The source contains a high-efficiency focusing machine which helps stabilize substrate temperature. Its sophisticated beam line control makes E 220 an ideal choice for a reliable implantation process. Specialty hardware, such as electrostatic deflectors and ion guides, provide precise control of the beam and ensure uniformity of the implantation. The automated beam line control will automatically adjust the beam size and shape as needed, resulting in precise and effective implantation of the desired ions. The tool comes with powerful software that makes the process user-friendly and convenient. Data logging, advanced diagnostics, and other monitoring features make it easier to track and analyze the progress of the implantation. The software also supports advanced statistical analysis and verifiable records. VARIAN E 220 is a versatile and reliable asset for advanced ion implantation needs. With its wide range of features and capabilities, it is well-suited to tackle demanding implantation requirements that involve a variety of materials. Its sophisticated hardware and software make it an ideal choice for achieving varied results at high precision levels.
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