Used VARIAN E220HP #9194813 for sale
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ID: 9194813
Vintage: 1995
Ion implanter, 8"
General configuration:
Terminal module / Beamline:
Scan generator: 20KeV
Mirror: 30KeV
Automatic graded decel option:
Decel relay & P/S: No
Hall probe option: No
End station module:
Wafer handler platform type: Standard
Platen type: M-Clamp
Roplat / Tilt type: Belt type
Enclosure:
Video viewing of wafer loading: No
Smoke detectors: Yes
Accessories:
Source turbo pump: SEIKO SEIKI STP1000C
Analyzer turbo pump: SEIKO SEIKI STP300C
Beamline turbo pump: SEIKO SEIKI STP1000C
Beam line booster pump: No
Stage pump: EBARA
Load-lock reough pump: EBARA
Load-lock pump: Cryo
Target cryo pump: Cryo
Mainframe
Missing parts:
Filament P/S
ARC P/S
Manipulator controller
Source magnet P/S
Analyzer magnet P/S
Q1 Magnet P/S
Q2 Magnet P/S
Terminal vacuum controller
Extraction P/S
Extraction stack
Extraction surppresion P/S
Analyzer chamber assy
Scanner assy
Setup cup assy
Mirror assy
Setup cup pre-amp controller
Source chamber assy
Source head assy
Source magnet assy
Manipulator assy
Source isolation valve assy
Lens magnet P/S
Source turbo controller
Source turbo pump
Source roughing pump
Terminal D.I filter assy
Trek (Scanner) P/S
B/L Turbo pump
Beam dump cup assy
Traveling (Target) faraday assy
Left L/L door assy
Left L/L pivot assy
L/L Isolation valve assy
Left L/L cryo pump
Target chamber cryo pump
Focer (Linear motor) assy with plate assy
Right L/L chamber vent module (Filter)
PH3 Gas line module assy
AsH3 Gas line module assy
Scan faraday controller assy
Vert. lift orienter controller
Uniformity controller
Linear motor servo controller
Orient controller
Left elevator controller
D.I Temperature monitor controller
Dose integrator controller
1995 vintage.
VARIAN E220HP is an ion implanter and monitor designed for industrial applications such as implantation, irradiation and laboratory use. This device is the latest model in ion implanter and monitoring equipment and offers superior performance to earlier models. The main feature of VARIAN E220 HP is its efficient and precise energy delivery equipment which can precisely control the delivery of energy for detailed, precise implantation and irradiation operations. This efficient, precise energy delivery is optimized by an innovative scanner system, and four-quadrant beam deflection, which provides superior dynamic focus control and superior beam correction. The device can be integrated with a controller or computer unit to streamline operations, and the intuitive user interface ensures easy navigation and efficient operation. E 220 HP is extremely reliable, as it has been designed to comply with the highest safety standards. All components are of the highest quality, ensuring a long life. This includes the separate ion beam and ion source machine, which delivers a wide, homogeneous range of energies for optimal implantation and irradiation results. E220 HP also offers several features for efficient, accurate monitoring of the establishment and state of implanted materials. This includes an optical detection tool that can detect contaminants from a wide range of sources, such as ion implantation, electron beam bombardment and laser processes. In addition to this, the device can also monitor the thermal and magnetic properties of the asset, to guarantee the delivery of a uniform and consistent dose for high-precision results. The monitor also provides several other features such as automatic calibration, operational alarms, and user-defined profile parameters. Overall, E220HP is a versatile and dependable ion implanter and monitor that provides exceptional performance and accuracy. Its efficient, precise energy delivery model and advanced monitoring capabilities make it an ideal choice for a range of industrial and laboratory applications.
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