Used VARIAN E220HP #9222331 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9222331
Wafer Size: 6"
Medium current ion implanter, 6"
(2) Stage EBARA dry pumps
EBARA E/S Rough dry pump
EBARA Source roughing dry pump
Compressor: CTI-8500 / SUZUKI C300
He line: 15M
Target cryo: CT-8F
Load lock pump: SUZUKI Baby Cryo
Source Pump: SEIKO SEIKI Turbo pump
Aperture pump: SEIKO SEIKI Turbo pump
Scanner pump: SEIKO SEIKI Turbo pump
Vacuum system Gauge: CCIG
Cooling system: Ground & terminal water pump
Power system:
UPS
Wafer handler system
Hand off type: Standard
Handler motor
Platen (Mechanical)
Roplat head
Roplat cable
Tilter assy P/N
Linear motor servo controller
Platen tilter servo controller
Rotating platen / Scanfara controller
Ropins motor
Scan field forcer
Heat exchange
Orienter motor (Belt type)
Orienter sensor (Lamp)
Orienter controller
Orienter lifter controller
Right elevator controller
Left elevator controller
Mapping sensor
Cassette / Tilt sensor
Service monitor
Gas supply system:
Gas bottle type: High pressure
(3) Gas bottle
Gas box type: HP
Beam generation / Source:
Ion source: E11030996 Bernas
Arc PS
Filament PS
Extraction PS: 40 kV
Extraction suppression PS
AMU Power supply
Lens power supply
E220 Source bushing
2 Step reducer
Beam generation / Beam-line
Trek amplifier: 20 KV
Acceleration PS: 180 KV
Acceleration suppression PS
Acceleration column
Mirror PS
Decel PS
PCB Scan generator
Scan generator controller
Beam measurement & scan check:
Uniformity controller
Dose integrator control
Beam purity check
Faraday
No Accel / Decel switch hardware
Quality kit: E220 Energy probe
Automation: Host.
VARIAN E220HP is an ion implanter and monitor equipment used for semiconductor fabrication. This system is an upgrade from the 220 series of implanters and provides a larger beam of ions for material modification and dopant implantation. This implanter features an incredibly powerful control unit, allowing for precise control of the beam and its parameters. The machine is also outfitted with several safety systems, such as feeder detection, implanter motor overload, and overpressure detectors. The main benefit of using VARIAN E220 HP is its high precision and accuracy during material modification processes. This tool is capable of dealing with a range of materials, including metals, semiconductors, and plastics. The asset's control model is designed to apply exact and consistent doses of implantation while maintaining limited beam size and flux density. Additionally, the equipment is capable of achieving ion energies ranging from 20 keV to 6000 keV, depending on the material being modified. E 220 HP is also equipped with several features that make system maintenance and diagnosing of issues easier. The unit is outfitted with a continuously monitored motion detection machine that eliminates interlocks needed for other ion implanters. The systems also features a touchscreen monitor and a comprehensive graphical user interface (GUI). This GUI provides real-time feedback of all tool diagnostics, from asset performance monitoring to errors. Overall, VARIAN E 220 HP is an incredibly powerful and precise ion implanter and monitor model, capable of handling a range of materials for accurate and consistent material modification. The equipment's safety features, motion detection system, and comprehensive graphical user interface make it an ideal choice for semiconductor fabrication.
There are no reviews yet